SCHEMBL301415

SCHEMBL301415

C=CC(=O)OCCOC(=O)c1ccccc1C(=O)OCCO

nearest known ligand 0.61

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
TSHR P16473 12/20 0.61
THRB P10828 1/20 0.55
CYP3A4 P08684 4/20 0.53
ALDH1A1 P00352 8/20 0.50
TDP1 Q9NUW8 3/20 0.47
L3MBTL1 Q9Y468 2/20 0.47
TP53 P04637 4/20 0.47
HIF1A Q16665 3/20 0.47
HSD17B10 Q99714 3/20 0.47
MAPK1 P28482 2/20 0.46
LMNA P02545 1/20 0.45
NPC1 O15118 2/20 0.42
GLA P06280 1/20 0.42
HPGD P15428 1/20 0.42
RAB9A P51151 1/20 0.42
SMN1; SMN2 Q16637 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29906120 1.00 TSHR (0.61) TSHRTHRBCYP3A4ALDH1A1TDP1
SCHEMBL29316375 0.94 TSHR (0.58) TSHRTHRBCYP3A4ALDH1A1TDP1
SCHEMBL228020 0.93 THRB (0.62) TSHRTHRBCYP3A4ALDH1A1TDP1
SCHEMBL67954 0.90 THRB (0.55) TSHRTHRBCYP3A4ALDH1A1TDP1
SCHEMBL5903626 0.89 CYP3A4 (0.51) TSHRTHRBCYP3A4ALDH1A1TDP1
Formic Acid SCHEMBL22720642 0.89 THRB (0.57) TSHRTHRBCYP3A4ALDH1A1TDP1
SCHEMBL9466853 0.89 TSHR (0.63) TSHRTHRBCYP3A4ALDH1A1TDP1
SCHEMBL17709526 0.88 CYP3A4 (0.50) TSHRTHRBCYP3A4ALDH1A1TDP1
SCHEMBL6295377 0.88 TSHR (0.53) TSHRTHRBCYP3A4ALDH1A1TDP1
SCHEMBL67527 0.87 THRB (0.59) TSHRTHRBCYP3A4ALDH1A1TDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 370 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2025085828-A1 SYSTEM AND METHOD FOR CONTROLLED POLYMER DEPOLYMERIZATION Intropic Materials Corporation (US) 2025-04-24 WO claimed
US-20250129391-A1 SYSTEM AND METHOD FOR CONTROLLED POLYMER DEPOLYMERIZATION Intropic Materials Corporation (US) 2025-04-24 US claimed
CN-112969732-B Photocurable resin composition, sealing material for fuel cell, cured product thereof, fuel cell, and sealing method 三键有限公司 2023-11-28 CN claimed
CN-108027556-B Photosensitive resin composition, photosensitive element, method for forming resist pattern, and method for manufacturing touch panel 昭和电工材料株式会社 2022-05-06 CN claimed
CN-112969732-A Photocurable resin composition, sealing material for fuel cell, cured product of the same, fuel cell, and sealing method 三键有限公司 2021-06-15 CN claimed
EP-1477848-B1 RADIATION-SENSITIVE RESIN COMPOSITION JSR CORP (JP) 2012-12-05 EP claimed
EP-1710021-B1 Method of forming a film by directing droplets of a liquid composition to a substrate HUNTSMAN ADV MAT SWITZERLAND (CH) 2009-03-25 EP claimed
US-7141355-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2006-11-28 US claimed
US-6855746-B2 Process for the production of molded particles for enzyme- or microbial cell-immobilization KANSAI PAINT CO., LTD. (JP) 2005-02-15 US claimed
US-20030100636-A1 Process for the production of molded particles for enzyme- or microbial cell-immobilization KANSAI PAINT CO., LTD. (JP) 2003-05-29 US claimed
US-5461087-A An ultraviolet curable adhesive comprising an acrylic acid ester of an alkyl alcohol and monofunctional oligoester acrylate; adhesion strength, low glass transition temperature SONY CORPORATION (JP) 1995-10-24 US claimed
EP-4438644-B1 PHOTOCURABLE COMPOSITION, COATING LAYER COMPRISING CURED PRODUCT THEREOF, AND PROCESS FILM LG CHEMICAL LTD (KR) 2026-05-27 EP disclosed
US-12624140-B2 Composition containing compound having polyoxyalkylene chain RESONAC CORPORATION (JP) 2026-05-12 US disclosed
US-12624141-B2 Composition set containing compound having polyoxyalkylene chain RESONAC CORPORATION (JP) 2026-05-12 US disclosed
EP-4722199-A1 AZOLE COMPOUND, METHOD FOR SYNTHESIZING SAID AZOLE COMPOUND, AND USE THEREOF SHIKOKU CHEMICALS CORPORATION (JP) 2026-04-08 EP disclosed
US-5461087-A An ultraviolet curable adhesive comprising an acrylic acid ester of an alkyl alcohol and monofunctional oligoester acrylate; adhesion strength, low glass transition temperature SONY CORPORATION (JP) 1995-10-24 US disclosed
US-5238783-A PHOTOSENSITIVE POLYMER COMPOSITION FOR WATER DEVELOPABLE FLEXOGRAPHIC PRINTING PLATE TORAY INDUSTRIES, INC. (JP) 1993-08-24 US disclosed
EP-0452656-A2 Photosensitive polymer composition for water developable flexographic printing plate TORAY INDUSTRIES, INC. (JP) 1991-10-23 EP disclosed
US-4889793-A PRINTING PLATES TORAY INDUSTRIES, INC. (JP) 1989-12-26 US disclosed
US-4038078-A PROCESS USING SUCTION TO FORM RELIEF IMAGES NIPPON PAINT CO., LTD. (JA) 1977-07-26 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-12624140-B2 Composition containing compound having polyoxyalkylene chain PIEZO1, HVCN1, TAF11 TSHR 3431/4885THRB 908/4885CYP3A4 2138/4885
US-12624141-B2 Composition set containing compound having polyoxyalkylene chain SET, SETD1B, SETDB1 TSHR 3995/4885THRB 2256/4885CYP3A4 2029/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.