SCHEMBL30166545

SCHEMBL30166545

[N-]=[N+]=C1C(=O)c2ccccc2C(=O)C1c1ccccc1

nearest known ligand 0.60

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAPT P10636 5/20 0.60
TP53 P04637 3/20 0.60
LMNA P02545 1/20 0.60
CYP1A2 P05177 1/20 0.60
CYP3A4 P08684 1/20 0.60
MAPK1 P28482 1/20 0.60
HTR2B P41595 1/20 0.60
KMT2A Q03164 5/20 0.44
RAB9A P51151 5/20 0.44
NPC1 O15118 5/20 0.44
MEN1 O00255 4/20 0.44
SMN1; SMN2 Q16637 2/20 0.44
MAPK10 P53779 1/20 0.44
KDM4E B2RXH2 1/20 0.44
GAA P10253 1/20 0.44
HPGD P15428 1/20 0.41
MAOA P21397 1/20 0.41
PTGS2 P35354 1/20 0.41
GSK3B P49841 1/20 0.37
CDC25B P30305 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Phenindione SCHEMBL29388073 0.77 MAPT (1.00) MAPTTP53LMNACYP1A2CYP3A4
Phenindione SCHEMBL33831 0.77 MAPT (1.00) MAPTTP53LMNACYP1A2CYP3A4
SCHEMBL7597246 0.75 S100A4 (0.47) MAPTTP53LMNACYP1A2CYP3A4
SCHEMBL10559114 0.75 MAPT (0.95) MAPTTP53LMNACYP1A2CYP3A4
Phenindione SCHEMBL6827577 0.75 MAPT (0.95) MAPTTP53LMNACYP1A2CYP3A4
Phenindione SCHEMBL1443973 0.75 MAPT (0.95) MAPTTP53LMNACYP1A2CYP3A4
Phenindione SCHEMBL16782144 0.73 MAPT (0.91) MAPTTP53LMNACYP1A2CYP3A4
SCHEMBL6848561 0.72 S100A4 (0.39) MAPTTP53LMNACYP1A2CYP3A4
SCHEMBL3147191 0.71 S100A4 (0.42) MAPTTP53LMNACYP1A2CYP3A4
SCHEMBL1412040 0.71 S100A4 (0.38) MAPTTP53LMNACYP1A2CYP3A4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11609496-B2 Method of forming patterned polyimide layer ECHEM SOLUTIONS CORP. (TW) 2023-03-21 US disclosed
CN-110895382-B Positive photoresist composition and method for forming patterned polyimide layer 新应材股份有限公司 2023-01-31 CN disclosed