Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LIG1 | P18858 | 1/20 | 0.55 |
| ▸ | GSTA1 | P08263 | 2/20 | 0.55 |
| ▸ | HPGD | P15428 | 5/20 | 0.55 |
| ▸ | LMNA | P02545 | 3/20 | 0.55 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.55 |
| ▸ | HIF1A | Q16665 | 2/20 | 0.55 |
| ▸ | ALOX15 | P16050 | 2/20 | 0.55 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.55 |
| ▸ | PGR | P06401 | 1/20 | 0.55 |
| ▸ | ADORA3 | P0DMS8 | 1/20 | 0.55 |
| ▸ | AR | P10275 | 1/20 | 0.55 |
| ▸ | CHRM1 | P11229 | 1/20 | 0.55 |
| ▸ | TBXA2R | P21731 | 1/20 | 0.55 |
| ▸ | SLC6A2 | P23975 | 1/20 | 0.55 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.55 |
| ▸ | ADRA1A | P35348 | 1/20 | 0.55 |
| ▸ | KDM4E | B2RXH2 | 4/20 | 0.54 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.54 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.54 |
| ▸ | CA1 | P00915 | 2/20 | 0.54 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL30740067 | 1.00 | LIG1 (0.55) | LIG1GSTA1HPGDLMNACYP3A4 | |
| SCHEMBL245254 | 0.93 | FNTA (0.58) | LIG1GSTA1HPGDLMNACYP3A4 | |
| SCHEMBL93431 | 0.91 | GSTA1 (0.56) | LIG1GSTA1HPGDLMNACYP3A4 | |
| SCHEMBL29660832 | 0.91 | GSTA1 (0.56) | LIG1GSTA1HPGDLMNACYP3A4 | |
| 2,2'-Dihydroxybenzphenone SCHEMBL18422 | 0.88 | HPGD (0.67) | LIG1GSTA1HPGDLMNACYP3A4 | |
| 2,2'-Dihydroxybenzphenone SCHEMBL29572496 | 0.88 | HPGD (0.67) | LIG1GSTA1HPGDLMNACYP3A4 | |
| SCHEMBL9686287 | 0.87 | SELL (0.66) | LIG1GSTA1HPGDLMNACYP3A4 | |
| SCHEMBL29468156 | 0.86 | HDAC1 (0.59) | GSTA1HPGDLMNAALOX15KDM4E | |
| SCHEMBL273458 | 0.86 | HDAC1 (0.59) | GSTA1HPGDLMNAALOX15KDM4E | |
| 2,2'-Dihydroxybenzphenone SCHEMBL11145317 | 0.85 | LIG1 (0.64) | LIG1GSTA1HPGDLMNACYP3A4 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Appears in 2771 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2025055600-A1 | SURFACE TREATMENT METHOD FOR METAL OR ALLOY, AND METAL OR ALLOY PRODUCT | 福耀玻璃工业集团股份有限公司 | 2025-03-20 | — | — | WO | claimed |
| CN-119591780-A | Photoresist additive and photoresist composition | 合肥鼎材科技有限公司 | 2025-03-11 | — | — | CN | claimed |
| CN-115793397-B | High-precision quartz substrate gluing and production process thereof | 安徽禾臣新材料有限公司 | 2024-11-05 | — | — | CN | claimed |
| CN-118085587-B | Ultraviolet absorber, modified polyester, and preparation methods and applications thereof | 中国科学院宁波材料技术与工程研究所 | 2024-06-25 | — | — | CN | claimed |
| WO-2024128554-A1 | METHOD FOR PREPARING CARBON DIOXIDE-EPOXIDE REACTION CATALYST, CARBON DIOXIDE-EPOXIDE REACTION CATALYST, AND POLYMER SYNTHESIS METHOD | 아주대학교산학협력단 | 2024-06-20 | — | — | WO | claimed |
| CN-118119593-A | Multifunctional crosslinking agent: compounds, compositions and products thereof | 生物涂层有限公司 | 2024-05-31 | — | — | CN | claimed |
| CN-114114835-B | Additive and photoresist composition containing same | 陕西彩虹新材料有限公司 | 2024-05-28 | — | — | CN | claimed |
| CN-118085587-A | Ultraviolet absorber, modified polyester, and preparation methods and applications thereof | 中国科学院宁波材料技术与工程研究所 | 2024-05-28 | — | — | CN | claimed |
| US-20240010890-A1 | FLUX-COMPATIBLE EPOXY-PHENOLIC ADHESIVE COMPOSITIONS FOR LOW GAP UNDERFILL APPLICATIONS | HENKEL AG & CO. KGAA (DE) | 2024-01-11 | — | — | US | claimed |
| CN-117062890-A | Flux compatible epoxy-phenolic adhesive compositions for low gap underfill applications | 汉高股份有限及两合公司 | 2023-11-14 | — | — | CN | claimed |
| EP-0089249-B1 | A DEVELOPER SOLUTION FOR A POSITIVE-WORKING LIGHT-SENSITIVE COMPOSITION, AND A METHOD OF DEVELOPMENT USING THE DEVELOPER SOLUTION | EASTMAN KODAK COMPANY (a New Jersey corporation) (US) | 1988-05-25 | — | — | EP | claimed |
| WO-1988002878-A1 | IMAGE REVERSAL SYSTEM AND PROCESS | MACDERMID, INCORPORATED (US) | 1988-04-21 | — | — | WO | claimed |
| US-4732836-A | SOLUTION STABILITY PHENOLIC COMPOUNDS CONDENSED WITH QUINONES | HOECHST CELANESE CORPORATION (US) | 1988-03-22 | — | — | US | claimed |
| US-4732837-A | Novel mixed ester O-quinone photosensitizers | HOECHST CELANESE CORPORATION (US) | 1988-03-22 | — | — | US | claimed |
| EP-0253548-A2 | Method for the determination of occult blood and chemical compositions therefor | SAVYON DIAGNOSTICS LTD. (IL) | 1988-01-20 | — | — | EP | claimed |
| EP-0226741-A2 | Process for producing a positive photoresist | HOECHST CELANESE CORPORATION (US) | 1987-07-01 | — | — | EP | claimed |
| US-4650745-A | Method of forming a resist pattern by radiation exposure of positive-working resist coating comprising a dye and a trihydroxybenzophenone compound and subsequent aqueous alkaline development | PHILIP A. HUNT CHEMICAL CORPORATION (US) | 1987-03-17 | — | — | US | claimed |
| US-4626492-A | Positive-working o-quinone diazide photoresist composition containing a dye and a trihydroxybenzophenone compound | OLIN HUNT SPECIALTY PRODUCTS, INC. (US) | 1986-12-02 | — | — | US | claimed |
| EP-0190799-A1 | Method of manufacturing a device: | Koninklijke Philips Electronics N.V. (NL) | 1986-08-13 | — | — | EP | claimed |
| US-4550069-A | PHOTOSPEED INCREASED | AMERICAN HOECHST CORPORATION (US) | 1985-10-29 | — | — | US | claimed |