Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | GSTA1 | P08263 | 2/20 | 0.56 |
| ▸ | HDAC1 | Q13547 | 1/20 | 0.55 |
| ▸ | SELL | P14151 | 1/20 | 0.54 |
| ▸ | SELP | P16109 | 1/20 | 0.54 |
| ▸ | LIG1 | P18858 | 1/20 | 0.52 |
| ▸ | HPGD | P15428 | 5/20 | 0.51 |
| ▸ | HIF1A | Q16665 | 2/20 | 0.51 |
| ▸ | LMNA | P02545 | 2/20 | 0.51 |
| ▸ | ALOX15 | P16050 | 2/20 | 0.51 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.51 |
| ▸ | PGR | P06401 | 1/20 | 0.51 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.51 |
| ▸ | ADORA3 | P0DMS8 | 1/20 | 0.51 |
| ▸ | AR | P10275 | 1/20 | 0.51 |
| ▸ | CHRM1 | P11229 | 1/20 | 0.51 |
| ▸ | TBXA2R | P21731 | 1/20 | 0.51 |
| ▸ | SLC6A2 | P23975 | 1/20 | 0.51 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.51 |
| ▸ | ADRA1A | P35348 | 1/20 | 0.51 |
| ▸ | KDM4E | B2RXH2 | 5/20 | 0.50 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29660832 | 1.00 | GSTA1 (0.56) | GSTA1HDAC1SELLSELPLIG1 | |
| SCHEMBL30740067 | 0.91 | LIG1 (0.55) | GSTA1LIG1HPGDHIF1ALMNA | |
| SCHEMBL29468156 | 0.91 | HDAC1 (0.59) | GSTA1HDAC1SELLSELPHPGD | |
| SCHEMBL273458 | 0.91 | HDAC1 (0.59) | GSTA1HDAC1SELLSELPHPGD | |
| SCHEMBL3656656 | 0.91 | HDAC1 (0.59) | GSTA1HDAC1SELLSELPHPGD | |
| SCHEMBL301928 | 0.91 | LIG1 (0.55) | GSTA1LIG1HPGDHIF1ALMNA | |
| SCHEMBL9686287 | 0.91 | SELL (0.66) | GSTA1HDAC1SELLSELPLIG1 | |
| SCHEMBL1063407 | 0.87 | SELL (0.68) | HDAC1SELLSELPHPGDALOX15 | |
| SCHEMBL22938973 | 0.86 | ALDH1A1 (0.65) | GSTA1SELLSELPLIG1HPGD | |
| SCHEMBL245254 | 0.84 | FNTA (0.58) | GSTA1HDAC1SELLSELPLIG1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 334 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-106471043-B | UV-active chromophore functionalized polysiloxanes and copolymers made therefrom | 莫门蒂夫性能材料股份有限公司 | 2021-01-12 | — | — | CN | claimed |
| CN-101355056-B | Method for manufacturing thin film transistor substrate and photosensitive composition used in the substrate | SAMSUNG DISPLAY CO LTD | 2014-02-26 | — | — | CN | claimed |
| US-7718754-B2 | Promoter for polycondensation reaction | KAO CORPORATION (JP) | 2010-05-18 | — | — | US | claimed |
| EP-0395346-B1 | Photosensitive composition | FUJI PHOTO FILM CO LTD (JP) | 1996-11-27 | — | — | EP | claimed |
| US-5283324-A | Reacting phenol compound and quinone diazide sulfonyl halide in solvent mixtures of different dielectric constants | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1994-02-01 | — | — | US | claimed |
| EP-0395346-A2 | Photosensitive composition | Fuji Photo Film Co., Ltd. (JP) | 1990-10-31 | — | — | EP | claimed |
| JP-1281445-A | — | — | None | — | — | JP | disclosed |
| US-12339586-B2 | Photocurable resin composition containing self-crosslinkable polymer | NISSAN CHEMICAL CORPORATION (JP) | 2025-06-24 | — | — | US | disclosed |
| US-20250116936-A1 | PHOTOCURABLE RESIN COMPOSITION CONTAINING SELF-CROSSLINKABLE POLYMER | NISSAN CHEMICAL CORPORATION (JP) | 2025-04-10 | — | — | US | disclosed |
| EP-4485077-A1 | PHOTOCURABLE RESIN COMPOSITION CONTAINING SELF-CROSSLINKING POLYMER | Nissan Chemical Corporation (JP) | 2025-01-01 | — | — | EP | disclosed |
| US-11886144-B2 | Binder resin composition for toner | KAO CORPORATION (JP) | 2024-01-30 | — | — | US | disclosed |
| CN-113485072-B | Photoresist composition and application thereof | 北京科华微电子材料有限公司 | 2023-11-07 | — | — | CN | disclosed |
| CN-116880125-A | Positive photosensitive resin composition, use thereof, and metal patterning method using the same | 深圳市容大感光科技股份有限公司 | 2023-10-13 | — | — | CN | disclosed |
| CN-85108256-A | LIGHT-SENSITIVE SILVER HALIDE PHOTOGRAPHIC MATERIAL | — | 1986-05-10 | — | — | CN | disclosed |
| US-4581327-A | CORE AND SHELL STRUCTURES, RHODIUM DOPED SHELLS, HARDNESS OF TONE, STORAGE STABILITY | KONISHIROKU PHOTO INDUSTRY CO., LTD. (JP) | 1986-04-08 | — | — | US | disclosed |
| US-4564589-A | Image-forming composite with film | ADVANCED IMAGING SYSTEMS LTD. (US) | 1986-01-14 | — | — | US | disclosed |
| EP-0146302-A1 | Light-sensitive silver halide photographic material for direct-post and method for processing the same | KONICA CORPORATION (JP) | 1985-06-26 | — | — | EP | disclosed |
| US-4444875-A | LAYER OF A TETRAZOLIUM COMPOUND | KONISHIROKU PHOTO INDUSTRY CO., LTD. (JP) | 1984-04-24 | — | — | US | disclosed |
| US-4211835-A | TETRAZOLIUM COMPOUND, BLACK AND WHITE, HIGH CONTRAST | KONISHIROKU PHOTO INDUSTRY CO., LTD. (JP) | 1980-07-08 | — | — | US | disclosed |
| US-4192682-A | NON-DIFFUSIBLE COMPOUND HAVING OXIDATION POWER ON A HYDROQUINONE DEVELOPING AGENT; DEVELOPER CONTAINING NO HYDROQUINONE | KONISHIROKU PHOTO INDUSTRY CO., LTD. (JP) | 1980-03-11 | — | — | US | disclosed |