SCHEMBL29660832

SCHEMBL29660832

O=C(c1ccccc1O)c1ccc(O)c(O)c1O

nearest known ligand 0.66

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
GSTA1 P08263 2/20 0.56
HDAC1 Q13547 1/20 0.55
SELL P14151 1/20 0.54
SELP P16109 1/20 0.54
LIG1 P18858 1/20 0.52
HPGD P15428 5/20 0.51
HIF1A Q16665 2/20 0.51
LMNA P02545 2/20 0.51
ALOX15 P16050 2/20 0.51
CYP1A2 P05177 1/20 0.51
PGR P06401 1/20 0.51
CYP3A4 P08684 1/20 0.51
ADORA3 P0DMS8 1/20 0.51
AR P10275 1/20 0.51
CHRM1 P11229 1/20 0.51
TBXA2R P21731 1/20 0.51
SLC6A2 P23975 1/20 0.51
CYP2C19 P33261 1/20 0.51
ADRA1A P35348 1/20 0.51
KDM4E B2RXH2 5/20 0.50

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL93431 1.00 GSTA1 (0.56) GSTA1HDAC1SELLSELPLIG1
SCHEMBL30740067 0.91 LIG1 (0.55) GSTA1LIG1HPGDHIF1ALMNA
SCHEMBL29468156 0.91 HDAC1 (0.59) GSTA1HDAC1SELLSELPHPGD
SCHEMBL273458 0.91 HDAC1 (0.59) GSTA1HDAC1SELLSELPHPGD
SCHEMBL3656656 0.91 HDAC1 (0.59) GSTA1HDAC1SELLSELPHPGD
SCHEMBL301928 0.91 LIG1 (0.55) GSTA1LIG1HPGDHIF1ALMNA
SCHEMBL9686287 0.91 SELL (0.66) GSTA1HDAC1SELLSELPLIG1
SCHEMBL1063407 0.87 SELL (0.68) HDAC1SELLSELPHPGDALOX15
SCHEMBL22938973 0.86 ALDH1A1 (0.65) GSTA1SELLSELPLIG1HPGD
SCHEMBL245254 0.84 FNTA (0.58) GSTA1HDAC1SELLSELPLIG1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-113485072-B Photoresist composition and application thereof 北京科华微电子材料有限公司 2023-11-07 CN disclosed
CN-116880125-A Positive photosensitive resin composition, use thereof, and metal patterning method using the same 深圳市容大感光科技股份有限公司 2023-10-13 CN disclosed
CN-112088198-B Treatment agent for 6-valent chromium, method for treating pollutant containing 6-valent chromium, and method for treating bone ash containing 6-valent chromium 西铁城时计株式会社 2023-10-03 CN disclosed
CN-116360213-A Resin composition and photoresist patterning method using the same 深圳市容大感光科技股份有限公司 2023-06-30 CN disclosed
CN-110268031-B Powdery composition for 6-valent chromium treatment, tablet, and method for producing leather 西铁城时计株式会社 2022-07-08 CN disclosed