Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | PRMT6 | Q96LA8 | 2/20 | 0.44 |
| ▸ | NCF1 | P14598 | 1/20 | 0.41 |
| ▸ | LMNA | P02545 | 1/20 | 0.40 |
| ▸ | PNMT | P11086 | 1/20 | 0.39 |
| ▸ | ENPP2 | Q13822 | 1/20 | 0.39 |
| ▸ | LOXL2 | Q9Y4K0 | 2/20 | 0.38 |
| ▸ | KLKB1 | P03952 | 2/20 | 0.37 |
| ▸ | AGXT | P21549 | 3/20 | 0.37 |
| ▸ | ATM | Q13315 | 1/20 | 0.34 |
| ▸ | F10 | P00742 | 1/20 | 0.34 |
| ▸ | NOS1 | P29475 | 1/20 | 0.33 |
| ▸ | NOS2 | P35228 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL28945107 | 1.00 | PRMT6 (0.44) | PRMT6NCF1LMNAPNMTENPP2 | |
| SCHEMBL30239523 | 1.00 | PRMT6 (0.44) | PRMT6NCF1LMNAPNMTENPP2 | |
| SCHEMBL30239452 | 0.84 | LOXL2 (0.39) | PRMT6NCF1LOXL2F10 | |
| SCHEMBL28945126 | 0.84 | LOXL2 (0.39) | PRMT6NCF1LOXL2F10 | |
| SCHEMBL27905277 | 0.79 | ADRA2C (0.47) | LMNAAGXT | |
| Hydrochloric Acid SCHEMBL28021391 | 0.78 | ADRA2C (0.46) | LMNAAGXT | |
| SCHEMBL27810311 | 0.76 | MEN1 (0.43) | LMNA | |
| SCHEMBL27662780 | 0.74 | AGXT (0.56) | PRMT6NCF1LMNAPNMTENPP2 | |
| SCHEMBL105023 | 0.74 | SIGMAR1 (0.41) | LMNA | |
| SCHEMBL6272216 | 0.74 | SIGMAR1 (0.41) | LMNA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-110234630-B | Phenylimidazolines having aminomethyl groups Compound or salt thereof and process for producing the same | 三菱瓦斯化学株式会社 | 2023-02-03 | — | — | CN | disclosed |