SCHEMBL3024913

SCHEMBL3024913

O=C(O)OS(=O)(=O)C(F)(F)S(c1ccccc1)(c1ccccc1)c1ccccc1

nearest known ligand 0.38

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
GAA P10253 1/20 0.38
L3MBTL1 Q9Y468 1/20 0.38
TSHR P16473 2/20 0.38
SMN1; SMN2 Q16637 1/20 0.38
HSD11B1 P28845 3/20 0.36
HTR6 P50406 1/20 0.35
KMT2A Q03164 3/20 0.35
CA1 P00915 2/20 0.34
CA2 P00918 2/20 0.34
APOBEC3G Q9HC16 1/20 0.34
CES1 P23141 1/20 0.34
MMP1 P03956 1/20 0.34
MMP2 P08253 1/20 0.34
MMP9 P14780 1/20 0.34
MMP8 P22894 1/20 0.34
MMP13 P45452 1/20 0.34
MEN1 O00255 2/20 0.34
ABCC9 O60706 1/20 0.34
ABCC8 Q09428 1/20 0.34
KCNJ11 Q14654 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6449720 0.83 GAA (0.41) GAAL3MBTL1TSHRSMN1; SMN2HSD11B1
SCHEMBL759936 0.79 HTR6 (0.39) TSHRSMN1; SMN2HSD11B1HTR6KMT2A
SCHEMBL19810159 0.75 TDP1 (0.42) TSHRSMN1; SMN2HSD11B1HTR6CA1
SCHEMBL27789460 0.75 TSHR (0.36) GAAL3MBTL1TSHRSMN1; SMN2KMT2A
SCHEMBL31184336 0.70 TSHR (0.48) TSHRSMN1; SMN2HSD11B1HTR6KMT2A
SCHEMBL9539580 0.70 TSHR (0.48) TSHRSMN1; SMN2HSD11B1HTR6KMT2A
SCHEMBL756008 0.69 GAA (0.45) GAAL3MBTL1SMN1; SMN2HSD11B1KMT2A
SCHEMBL8864068 0.69 ALDH1A1 (0.38) L3MBTL1CA1CA2ALDH1A1CA7
SCHEMBL27259817 0.69 TSHR (0.46) TSHRSMN1; SMN2HSD11B1HTR6KMT2A
SCHEMBL27830939 0.69 TSHR (0.46) TSHRSMN1; SMN2HSD11B1HTR6KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20100203446-A1 CHEMICALLY AMPLIFIED PHOTORESIST COMPOSITION AND METHOD FOR FORMING PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2010-08-12 US disclosed