Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | GAA | P10253 | 1/20 | 0.41 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.41 |
| ▸ | HTT | P42858 | 2/20 | 0.40 |
| ▸ | MAPT | P10636 | 2/20 | 0.40 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.40 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.40 |
| ▸ | BCAT1 | P54687 | 1/20 | 0.39 |
| ▸ | HSD11B1 | P28845 | 3/20 | 0.38 |
| ▸ | TSHR | P16473 | 3/20 | 0.38 |
| ▸ | MEN1 | O00255 | 2/20 | 0.38 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.38 |
| ▸ | POLB | P06746 | 2/20 | 0.38 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.38 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.38 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.37 |
| ▸ | LMNA | P02545 | 1/20 | 0.37 |
| ▸ | ABCC9 | O60706 | 1/20 | 0.37 |
| ▸ | ABCC8 | Q09428 | 1/20 | 0.37 |
| ▸ | KCNJ11 | Q14654 | 1/20 | 0.37 |
| ▸ | KCNJ8 | Q15842 | 1/20 | 0.37 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL27789460 | 0.89 | TSHR (0.36) | GAAL3MBTL1HTTMAPTSMN1; SMN2 | |
| SCHEMBL3024913 | 0.83 | GAA (0.38) | GAAL3MBTL1MAPTSMN1; SMN2HSD17B10 | |
| SCHEMBL6544600 | 0.74 | BCAT1 (0.47) | HTTMAPTSMN1; SMN2BCAT1HSD11B1 | |
| SCHEMBL759936 | 0.74 | HTR6 (0.39) | SMN1; SMN2HSD17B10HSD11B1TSHRMEN1 | |
| SCHEMBL27492334 | 0.73 | BCAT1 (0.46) | HTTMAPTSMN1; SMN2BCAT1HSD11B1 | |
| Hydrochloric Acid SCHEMBL28249179 | 0.73 | BCAT1 (0.46) | HTTMAPTSMN1; SMN2BCAT1HSD11B1 | |
| SCHEMBL1463079 | 0.72 | KMT2A (0.40) | GAAL3MBTL1SMN1; SMN2MEN1KMT2A | |
| SCHEMBL29098423 | 0.72 | F2 (0.36) | L3MBTL1SMN1; SMN2MAPK1ALDH1A1 | |
| SCHEMBL27881188 | 0.71 | GAA (0.49) | GAAL3MBTL1HTTMAPTSMN1; SMN2 | |
| SCHEMBL756008 | 0.71 | GAA (0.45) | GAAL3MBTL1HTTSMN1; SMN2HSD11B1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-101625523-B | Resist patterning forming process and manufacturing method of photo mask | SHIN ETSU EHEMICAL CO LTD | 2012-09-19 | — | — | CN | disclosed |
| CN-102591152-A | Resist composition and patterning process | SHIN ETSU EHEMICAL CO LTD | 2012-07-18 | — | — | CN | disclosed |
| CN-102520581-A | Method for forming photoresist pattern | SHINETSU CHEMICAL CO | 2012-06-27 | — | — | CN | disclosed |
| CN-101625523-A | Resist patterning process and manufacturing photo mask | SHINETSU CHEMICAL CO | 2010-01-13 | — | — | CN | disclosed |
| CN-101625524-A | Photoresist composition and pattern forming method | SHINETSU CHEMICAL CO | 2010-01-13 | — | — | CN | disclosed |
| US-6908722-B2 | Acid generator, sulfonic acid, sulfonic acid derivatives and radiation-sensitive resin composition | JSR CORPORATION (JP) | 2005-06-21 | — | — | US | disclosed |
| US-20030113658-A1 | Acid generator, sulfonic acid, sulfonic acid derivatives and radiation-sensitive resin composition | JSR CORPORATION (JP) | 2003-06-19 | — | — | US | disclosed |
| EP-1270553-A2 | Acid generator, sulfonic acid, sulfonic acid derivatives and radiation-sensitive resin composition | JSR Corporation (JP) | 2003-01-02 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20030113658-A1 | Acid generator, sulfonic acid, sulfonic acid derivatives and radiation-sensitive resin composition | ASIC1, PFAS, RARA | GAA 871/4885L3MBTL1 2359/4885HTT 4125/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.