SCHEMBL759936

SCHEMBL759936

O=S(=O)(OF)C(F)(F)S(c1ccccc1)(c1ccccc1)c1ccccc1

nearest known ligand 0.39

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HTR6 P50406 1/20 0.39
APOBEC3G Q9HC16 1/20 0.38
CA1 P00915 3/20 0.37
CA2 P00918 3/20 0.37
CA5A P35218 2/20 0.37
CA9 Q16790 2/20 0.37
ALDH1A1 P00352 2/20 0.37
HSD17B10 Q99714 1/20 0.37
TDP1 Q9NUW8 1/20 0.37
CA12 O43570 1/20 0.37
CA3 P07451 1/20 0.37
CA4 P22748 1/20 0.37
CA6 P23280 1/20 0.37
CA7 P43166 1/20 0.37
PLA2G7 Q13093 1/20 0.37
CA13 Q8N1Q1 1/20 0.37
CA14 Q9ULX7 1/20 0.37
CA5B Q9Y2D0 1/20 0.37
TSHR P16473 1/20 0.37
SMN1; SMN2 Q16637 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL756008 0.87 GAA (0.45) ALDH1A1TDP1SMN1; SMN2HSD11B1MMP1
SCHEMBL927174 0.81 HTR6 (0.37) HTR6APOBEC3GCA1CA2CA5A
SCHEMBL3024913 0.79 GAA (0.38) HTR6APOBEC3GCA1CA2CA5A
SCHEMBL19810159 0.79 TDP1 (0.42) HTR6APOBEC3GCA1CA2CA5A
SCHEMBL6449720 0.74 GAA (0.41) ALDH1A1HSD17B10TSHRSMN1; SMN2HSD11B1
SCHEMBL2990556 0.71 CA1 (0.57) HTR6CA1CA2CA5ACA9
SCHEMBL4389083 0.68 ALDH1A1 (0.41) HTR6APOBEC3GCA1CA2CA5A
SCHEMBL29776699 0.67 TDP1 (0.50) HTR6APOBEC3GCA1CA2CA5A
Silver SCHEMBL29776709 0.67 TDP1 (0.50) HTR6APOBEC3GCA1CA2CA5A
SCHEMBL28412285 0.67 TDP1 (0.50) HTR6APOBEC3GCA1CA2CA5A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 32 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10421853-B2 Photosensitive gas generating agent and photocurable composition CANON KABUSHIKI KAISHA (JP) 2019-09-24 US disclosed
CN-109976091-A The manufacture of photosensitive resin composition, pattern forming method and optoelectronic semiconductor component 信越化学工业株式会社 2019-07-05 CN disclosed
CN-104051380-B Wiring system and technique 台湾积体电路制造股份有限公司 2017-08-15 CN disclosed
EP-2941781-B1 PHOTOSENSITIVE GAS GENERATING AGENT AND PHOTOCURABLE COMPOSITION CANON KK (JP) 2017-08-09 EP disclosed
CN-104335366-B Photoactivated etching paste and its use 默克专利股份有限公司 2017-05-10 CN disclosed
EP-2302015-B1 OPTICALLY ISOTROPIC LIQUID CRYSTALLINE MEDIUM, AND OPTICAL ELEMENT JNC CORP (JP) 2016-10-05 EP disclosed
EP-2360229-B1 OPTICALLY ISOTROPIC LIQUID CRYSTAL MEDIUM AND OPTICAL ELEMENT JNC CORP (JP) 2016-08-31 EP disclosed
CN-105764993-A Silicon-containing heat- or photo-curable composition AZ电子材料(卢森堡)有限公司 2016-07-13 CN disclosed
US-20150368433-A1 PHOTOSENSITIVE GAS GENERATING AGENT AND PHOTOCURABLE COMPOSITION CANON KABUSHIKI KAISHA (JP) 2015-12-24 US disclosed
US-20150086755-A1 PHOTOCURED PRODUCT CANON KABUSHIKI KAISHA (JP) 2015-03-26 US disclosed
US-20110242473-A1 OPTICALLY ISOTROPIC LIQUID CRYSTAL MEDIUM AND OPTICAL DEVICE JNC CORPORATION (JP) 2011-10-06 US disclosed
EP-2360229-A1 OPTICALLY ISOTROPIC LIQUID CRYSTAL MEDIUM AND OPTICAL ELEMENT JNC Corporation (JP) 2011-08-24 EP disclosed
EP-2302015-A1 OPTICALLY ISOTROPIC LIQUID CRYSTALLINE MEDIUM, AND OPTICAL ELEMENT Chisso Corporation (JP) 2011-03-30 EP disclosed
US-20110069245-A1 OPTICALLY ISOTROPIC LIQUID CRYSTALLINE MEDIUM, AND OPTICAL ELEMENT CHISSO PETROCHEMICAL CORPORATION (JP) 2011-03-24 US disclosed
US-20100296029-A1 CHLOROFLUOROBENZENE COMPOUND, OPTICALLY ISOTROPIC LIQUID CRYSTAL MEDIUM, AND OPTICAL DEVICE CHISSO CORPORATION (JP) 2010-11-25 US disclosed
US-7722783-B2 Optically isotropic liquid crystal medium and optical device CHISSO CORPORATION (JP) 2010-05-25 US disclosed
EP-2098583-A2 Optically isotropic liquid crystal medium and optical device Chisso Corporation (JP) 2009-09-09 EP disclosed
US-20090135368-A1 OPTICALLY ISOTROPIC LIQUID CRYSTAL MEDIUM AND OPTICAL DEVICE CHISSO CORPORATION (JP) 2009-05-28 US disclosed
US-6849384-B2 Photoacid generators, photoresist compositions containing the same and pattering method with the use of the compositions NEC CORPORATION (JP) 2005-02-01 US disclosed
US-20030198889-A1 Photoacid generators, photoresist compositions containing the same and pattering method with the use of the compositions NEC CORPORATION (JP) 2003-10-23 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20150368433-A1 PHOTOSENSITIVE GAS GENERATING AGENT AND PHOTOCURABLE COMPOSITION PFN1, PFAS, FRG1 HTR6 3784/4885APOBEC3G 3323/4885CA1 3547/4885
US-20030198889-A1 Photoacid generators, photoresist compositions containing the same and pattering method with the use of the compositions PPOX, SULT1A1, TST HTR6 4663/4885APOBEC3G 3926/4885CA1 1739/4885
US-10421853-B2 Photosensitive gas generating agent and photocurable composition PFN1, PFAS, FRG1 HTR6 3784/4885APOBEC3G 3323/4885CA1 3547/4885
US-20100296029-A1 CHLOROFLUOROBENZENE COMPOUND, OPTICALLY ISOTROPIC LIQUID CRYSTAL MEDIUM, AND OPTICAL DEVICE DDT, BRAF, LEF1 HTR6 858/4885APOBEC3G 1972/4885CA1 577/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.