Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LMNA | P02545 | 4/20 | 0.50 |
| ▸ | CYP1A2 | P05177 | 3/20 | 0.50 |
| ▸ | CYP2D6 | P10635 | 3/20 | 0.50 |
| ▸ | CYP3A4 | P08684 | 3/20 | 0.49 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.49 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.49 |
| ▸ | CHRM2 | P08172 | 4/20 | 0.48 |
| ▸ | CHRM1 | P11229 | 4/20 | 0.48 |
| ▸ | CHRM3 | P20309 | 4/20 | 0.48 |
| ▸ | CHRM4 | P08173 | 2/20 | 0.48 |
| ▸ | CHRM5 | P08912 | 1/20 | 0.48 |
| ▸ | MEN1 | O00255 | 2/20 | 0.47 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.47 |
| ▸ | POLB | P06746 | 2/20 | 0.47 |
| ▸ | SCN1A | P35498 | 3/20 | 0.46 |
| ▸ | SCN2A | Q99250 | 3/20 | 0.46 |
| ▸ | SCN3A | Q9NY46 | 3/20 | 0.46 |
| ▸ | CYP2C9 | P11712 | 2/20 | 0.45 |
| ▸ | CYP2C19 | P33261 | 2/20 | 0.45 |
| ▸ | SIGMAR1 | Q99720 | 2/20 | 0.45 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Styrene SCHEMBL10585941 | 0.93 | LMNA (0.44) | LMNACYP1A2CYP2D6CYP3A4ALDH1A1 | |
| Styrene SCHEMBL6373581 | 0.92 | CHRM2 (0.48) | LMNACYP1A2CYP2D6CYP3A4ALDH1A1 | |
| Styrene SCHEMBL11131494 | 0.89 | BCHE (0.46) | LMNACYP1A2CYP2D6CYP3A4ALDH1A1 | |
| SCHEMBL5140572 | 0.87 | CHRM2 (0.49) | LMNACYP1A2CYP2D6CYP3A4ALDH1A1 | |
| Styrene SCHEMBL446411 | 0.86 | CHRM1 (0.43) | LMNACYP2D6ALDH1A1SMN1; SMN2CHRM2 | |
| Styrene SCHEMBL8361059 | 0.86 | THRB (0.47) | LMNAALDH1A1MEN1KMT2APOLB | |
| Styrene SCHEMBL5864400 | 0.85 | TSHR (0.46) | LMNAALDH1A1SMN1; SMN2MEN1KMT2A | |
| Styrene SCHEMBL5397619 | 0.84 | CHRM1 (0.41) | LMNACYP2D6ALDH1A1SMN1; SMN2CHRM2 | |
| Styrene SCHEMBL4565859 | 0.84 | KDM4E (0.47) | LMNACYP1A2CYP2D6CYP3A4ALDH1A1 | |
| Styrene SCHEMBL6562348 | 0.83 | TDP1 (0.50) | LMNAALDH1A1MEN1KMT2APOLB |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 46 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-114517890-B | Adaptive valve system based on specific gas response and manufacturing method thereof | 厦门大学 | 2024-02-09 | — | — | CN | disclosed |
| CN-113330340-B | Colloidal crystal structure, and light-emitting device and lighting system using same | 松下知识产权经营株式会社 | 2023-10-31 | — | — | CN | disclosed |
| CN-112424290-B | Colloid structure, colloid multiple structure, and method for producing colloid structure | 松下知识产权经营株式会社 | 2023-08-22 | — | — | CN | disclosed |
| CN-114517890-A | Self-adaptive valve system based on specific gas response and manufacturing method thereof | 厦门大学 | 2022-05-20 | — | — | CN | disclosed |
| CN-113330340-A | Colloidal crystal structure, and light-emitting device and lighting system using same | 松下知识产权经营株式会社 | 2021-08-31 | — | — | CN | disclosed |
| US-8389076-B2 | Peeling member, member for forming peeling member, method of manufacturing peeling member, image remover, image forming and removing system, and image removing method | RICOH COMPANY, LTD. (JP) | 2013-03-05 | — | — | US | disclosed |
| US-20100196630-A1 | PEELING MEMBER, MEMBER FOR FORMING PEELING MEMBER, METHOD OF MANUFACTURING PEELING MEMBER, IMAGE REMOVER, IMAGE FORMING AND REMOVING SYSTEM, AND IMAGE REMOVING METHOD | RICOH COMPANY, LTD. (JP) | 2010-08-05 | — | — | US | disclosed |
| EP-2188675-A1 | PEELING MEMBER, MEMBER FOR FORMING PEELING MEMBER, METHOD OF MANUFACTURING PEELING MEMBER, IMAGE REMOVER, IMAGE FORMING AND REMOVING SYSTEM, AND IMAGE REMOVING METHOD | Ricoh Company, Ltd. (JP) | 2010-05-26 | — | — | EP | disclosed |
| WO-2009035135-A1 | PEELING MEMBER, MEMBER FOR FORMING PEELING MEMBER, METHOD OF MANUFACTURING PEELING MEMBER, IMAGE REMOVER, IMAGE FORMING AND REMOVING SYSTEM, AND IMAGE REMOVING METHOD | RICOH COMPANY, LTD. (JP) | 2009-03-19 | — | — | WO | disclosed |
| US-7276465-B2 | Erasable image forming material | KABUSHIKI KAISHA TOSHIBA (JP) | 2007-10-02 | — | — | US | disclosed |
| US-5296266-A | Method of preparing microcapsule | SEIKO EPSON CORPORATION (JP) | 1994-03-22 | — | — | US | disclosed |
| US-5166041-A | Optical recording element, cationic dyes | SHOWA DENKO K.K. (JP) | 1992-11-24 | — | — | US | disclosed |
| EP-0475731-A2 | Development process and apparatus | SEIKO EPSON CORPORATION (JP) | 1992-03-18 | — | — | EP | disclosed |
| EP-0468465-A1 | Near infrared ray-decolorizable recording material | SHOWA DENKO KABUSHIKI KAISHA (JP) | 1992-01-29 | — | — | EP | disclosed |
| EP-0447045-A1 | Method of preparing micro capsules | SEIKO EPSON CORPORATION (JP) | 1991-09-18 | — | — | EP | disclosed |
| US-4883850-A | CONTROLLING POLYDISPERSITY | AQUALON COMPANY (US) | 1989-11-28 | — | — | US | disclosed |
| US-4628019-A | NONMAGNETIC, AMINOALKYL ACRYLATE COPOLYMER | CANON KABUSHIKI KAISHA (JP) | 1986-12-09 | — | — | US | disclosed |
| EP-0070505-B1 | USE OF HYDROPHOBICALLY MODIFIED WATER SOLUBLE POLYMERS IN SUSPENSION POLYMERIZATION | HERCULES INCORPORATED (US) | 1986-04-09 | — | — | EP | disclosed |
| EP-0070505-A1 | Use of hydrophobically modified water soluble polymers in suspension polymerization | HERCULES INCORPORATED (US) | 1983-01-26 | — | — | EP | disclosed |
| US-4352916-A | GOOD CONTROL OF PARTICLE SIZE WITHOUT FORMATION OF EMULSION POLYMER | HERCULES INCORPORATED (US) | 1982-10-05 | — | — | US | disclosed |