SCHEMBL3033666

SCHEMBL3033666

O=C1CC=CC2=C1C(=Cc1ccccc1)c1ccccc12

nearest known ligand 0.49

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HPGD P15428 4/20 0.41
MAOB P27338 3/20 0.36
MIF P14174 2/20 0.36
MAOA P21397 1/20 0.36
ALDH1A1 P00352 4/20 0.36
KDM4E B2RXH2 2/20 0.36
L3MBTL1 Q9Y468 2/20 0.36
HTT P42858 1/20 0.36
TDP1 Q9NUW8 1/20 0.36
CYP1A2 P05177 1/20 0.35
LMNA P02545 1/20 0.35
MAPK1 P28482 1/20 0.35
SMN1; SMN2 Q16637 1/20 0.35
HSD17B10 Q99714 1/20 0.35
MEN1 O00255 2/20 0.35
KMT2A Q03164 2/20 0.35
TUBB4A P04350 1/20 0.35
TUBB P07437 1/20 0.35
TUBA3C P0DPH7 1/20 0.35
AR P10275 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL544352 0.85 MAPT (0.48) HPGDMAOBMIFMAOAALDH1A1
SCHEMBL10900576 0.78 MAOA (0.36) MAOBMAOAKDM4EHTTTDP1
SCHEMBL28829617 0.77 MAOA (0.36) MAOBMAOAKDM4EHTTTDP1
SCHEMBL1501865 0.75 CDC25B (0.41) HPGDMAOBMAOAALDH1A1KDM4E
SCHEMBL3829679 0.72
SCHEMBL8778476 0.68 TUBB4A (0.52) HPGDMAOBMIFMAOAALDH1A1
SCHEMBL8778480 0.68 TUBB4A (0.52) HPGDMAOBMIFMAOAALDH1A1
SCHEMBL5494021 0.68 CDC25B (0.41) HPGDMAOBMAOAALDH1A1KDM4E
SCHEMBL4541307 0.68 CYP19A1 (0.62) HPGDMAOBMIFMAOAALDH1A1
SCHEMBL4726286 0.67 TUBB4A (0.65) HPGDMAOBMIFMAOAALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8652757-B2 Method for forming resist underlayer film, patterning process using the same, and composition for the resist underlayer film SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-02-18 US disclosed
US-20130184404-A1 METHOD FOR FORMING RESIST UNDERLAYER FILM, PATTERNING PROCESS USING THE SAME, AND COMPOSITION FOR THE RESIST UNDERLAYER FILM SHIN-ETSU CHEMICAL CO., LTD. (JP) 2013-07-18 US disclosed
US-8450048-B2 Method for forming resist underlayer film, patterning process using the same, and composition for the resist underlayer film SHIN-ETSU CHEMICAL CO., LTD. (JP) 2013-05-28 US disclosed
US-20100099044-A1 Method for forming resist underlayer film, patterning process using the same, and composition for the resist underlayer film SHIN-ETSU CHEMICAL CO.,LTD. (JP) 2010-04-22 US disclosed