⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10900576 | 0.81 | MAOA (0.36) | — | |
| SCHEMBL28829617 | 0.79 | MAOA (0.36) | — | |
| SCHEMBL1501865 | 0.78 | CDC25B (0.41) | — | |
| SCHEMBL5094569 | 0.74 | MEN1 (0.34) | — | |
| SCHEMBL28310749 | 0.73 | SMN1; SMN2 (0.35) | — | |
| SCHEMBL3033666 | 0.72 | HPGD (0.41) | — | |
| SCHEMBL5494021 | 0.70 | CDC25B (0.41) | — | |
| Terephthalamide SCHEMBL27579267 | 0.69 | PARP10 (0.41) | — | |
| SCHEMBL731491 | 0.68 | MAPT (0.34) | — | |
| SCHEMBL4238710 | 0.68 | MEN1 (0.34) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 24 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1449833-B1 | BISIMIDE COMPOUND, ACID GENERATOR AND RESIST COMPOSITION EACH CONTAINING THE SAME, AND METHOD OF FORMING PATTERN FROM THE COMPOSITION | WAKO PURE CHEM IND LTD (JP) | 2009-09-09 | — | — | EP | disclosed |
| US-7374857-B2 | Bismide compound, acid generator and resist composition each containing the same, and method of forming pattern from the composition | WAKO PURE CHEMICAL INDUSTRIES LTD. (JP) | 2008-05-20 | — | — | US | disclosed |
| EP-1314725-B1 | SULFONIUM SALT COMPOUND | WAKO PURE CHEM IND LTD (JP) | 2008-03-19 | — | — | EP | disclosed |
| EP-1059563-B1 | Agent for reducing substrate dependence of resist | WAKO PURE CHEM IND LTD (JP) | 2006-08-09 | — | — | EP | disclosed |
| US-6924323-B2 | Sulfonium salt compound | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 2005-08-02 | — | — | US | disclosed |
| US-20050038261-A1 | Bismide compound, acid generator and resist composition each containing the same, and method of forming pattern from the composition | WAKO PURE CHEMICAL INDUSTRIES LTD. (JP) | 2005-02-17 | — | — | US | disclosed |
| EP-1059314-B1 | A resist composition | WAKO PURE CHEM IND LTD (JP) | 2004-12-22 | — | — | EP | disclosed |
| EP-1449833-A1 | BISIMIDE COMPOUND, ACID GENERATOR AND RESIST COMPOSITION EACH CONTAINING THE SAME, AND METHOD OF FORMING PATTERN FROM THE COMPOSITION | Wako Pure Chemical Industries, Ltd. (JP) | 2004-08-25 | — | — | EP | disclosed |
| US-6723483-B1 | Sulfonium salt compounds | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 2004-04-20 | — | — | US | disclosed |
| US-6716573-B2 | Resist Composition | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 2004-04-06 | — | — | US | disclosed |
| US-20030039920-A1 | Resist composition | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 2003-02-27 | — | — | US | disclosed |
| EP-1238969-A2 | Sulfonium salt compounds | Wako Pure Chemical Industries, Ltd. (JP) | 2002-09-11 | — | — | EP | disclosed |
| US-6432608-B1 | FINENESS PATTERN | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 2002-08-13 | — | — | US | disclosed |
| EP-1113005-A1 | Sulfonium salt compounds | Wako Pure Chemical Industries, Ltd. (JP) | 2001-07-04 | — | — | EP | disclosed |
| EP-1059563-A1 | Agent for reducing substrate dependence of resist | Wako Pure Chemical Industries, Ltd. (JP) | 2000-12-13 | — | — | EP | disclosed |
| EP-1059314-A1 | A resist composition | Wako Pure Chemical Industries, Ltd. (JP) | 2000-12-13 | — | — | EP | disclosed |
| EP-0704762-B1 | Resist material and pattern formation | WAKO PURE CHEM IND LTD (JP) | 1999-12-15 | — | — | EP | disclosed |
| US-5558971-A | HYDROXYSTYRENE POLYMER DERIVATIVES, PHOTOACID GENERATOR | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 1996-09-24 | — | — | US | disclosed |
| US-5558976-A | HYDROXYSTYRENE POLYMER DERIVATIVES, PHOTOACID GENERATOR, PHOTORESISTS | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 1996-09-24 | — | — | US | disclosed |
| EP-0704762-A1 | Resist material and pattern formation | WAKO PURE CHEMICAL INDUSTRIES LTD (JP) | 1996-04-03 | — | — | EP | disclosed |