SCHEMBL30355205

SCHEMBL30355205

Cc1ccccc1-c1ccccc1[I+]C(C)C.Fc1c(F)c(F)c([B-](c2c(F)c(F)c(F)c(F)c2F)(c2c(F)c(F)c(F)c(F)c2F)c2c(F)c(F)c(F)c(F)c2F)c(F)c1F

nearest known ligand 0.30

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
BRD4 O60885 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29547824 0.87 ACHE (0.33)
SCHEMBL29738707 0.83 BRD4 (0.39) BRD4
SCHEMBL29738710 0.83 BRD4 (0.39) BRD4
SCHEMBL6609964 0.75 ACHE (0.37)
SCHEMBL1628372 0.74 L3MBTL1 (0.35)
SCHEMBL28365684 0.74 LDHA (0.33)
O-Xylene SCHEMBL30386408 0.72 TSHR (0.48)
O-Xylene SCHEMBL30509215 0.72 TSHR (0.48)
SCHEMBL31668371 0.72 ALDH1A1 (0.35)
SCHEMBL3762885 0.72 ALDH1A1 (0.35)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-116194845-A Photomask, exposure method, method for producing resin pattern, and method for producing photomask 富士胶片株式会社 2023-05-30 CN disclosed