SCHEMBL30366540

SCHEMBL30366540

Fc1ccc(F)c2ccccc12

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HPRT1 P00492 1/20 0.46
SLC6A4 P31645 3/20 0.43
SLC6A3 Q01959 3/20 0.43
ALDH1A1 P00352 2/20 0.42
TSHR P16473 2/20 0.42
KDM4E B2RXH2 1/20 0.41
MPI P34949 1/20 0.41
L3MBTL1 Q9Y468 1/20 0.41
ACHE P22303 1/20 0.40
CYP2A6 P11509 2/20 0.39
HSD17B10 Q99714 1/20 0.39
TDP1 Q9NUW8 1/20 0.39
HTT P42858 2/20 0.38
NPSR1 Q6W5P4 2/20 0.38
GAA P10253 1/20 0.38
NFE2L2 Q16236 1/20 0.38
HTR1B P28222 1/20 0.37
HTR2B P41595 1/20 0.37
GPR65 Q8IYL9 1/20 0.37
DAO P14920 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6562728 1.00 HPRT1 (0.46) HPRT1SLC6A4SLC6A3ALDH1A1TSHR
SCHEMBL16917822 0.90 HTR1B (0.42) HPRT1SLC6A4SLC6A3ALDH1A1TSHR
SCHEMBL5015496 0.85 CES2 (0.43) HPRT1SLC6A4ALDH1A1TSHRKDM4E
SCHEMBL29618976 0.85 CES2 (0.43) HPRT1SLC6A4ALDH1A1TSHRKDM4E
SCHEMBL4219687 0.83 SLC6A4 (0.37) HPRT1SLC6A4SLC6A3ALDH1A1TSHR
SCHEMBL4074883 0.83 ALDH1A1 (0.52) HPRT1SLC6A4SLC6A3ALDH1A1TSHR
SCHEMBL423873 0.83 CYP1A2 (0.68) HPRT1SLC6A4SLC6A3ALDH1A1TSHR
SCHEMBL2526944 0.83 HPRT1 (0.37) HPRT1SLC6A4SLC6A3ALDH1A1TSHR
SCHEMBL484933 0.83 IDO1 (0.68) TSHRKDM4EMPIL3MBTL1HSD17B10
SCHEMBL19016682 0.83 HPRT1 (0.37) HPRT1SLC6A4SLC6A3ALDH1A1TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-115991815-B Halogenated modified prepared photoresist resin material and preparation method thereof 中国科学院长春应用化学研究所 2025-03-07 CN disclosed
CN-116419937-A Composition for forming resist underlayer film 日产化学株式会社 2023-07-11 CN disclosed
CN-115991815-A Halogenated modified prepared photoresist resin material and preparation method thereof 中国科学院长春应用化学研究所 2023-04-21 CN disclosed