SCHEMBL6562728

SCHEMBL6562728

Fc1ccc(F)c2ccccc12

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HPRT1 P00492 1/20 0.46
SLC6A4 P31645 3/20 0.43
SLC6A3 Q01959 3/20 0.43
ALDH1A1 P00352 2/20 0.42
TSHR P16473 2/20 0.42
KDM4E B2RXH2 1/20 0.41
MPI P34949 1/20 0.41
L3MBTL1 Q9Y468 1/20 0.41
ACHE P22303 1/20 0.40
CYP2A6 P11509 2/20 0.39
HSD17B10 Q99714 1/20 0.39
TDP1 Q9NUW8 1/20 0.39
HTT P42858 2/20 0.38
NPSR1 Q6W5P4 2/20 0.38
GAA P10253 1/20 0.38
NFE2L2 Q16236 1/20 0.38
HTR1B P28222 1/20 0.37
HTR2B P41595 1/20 0.37
GPR65 Q8IYL9 1/20 0.37
DAO P14920 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL30366540 1.00 HPRT1 (0.46) HPRT1SLC6A4SLC6A3ALDH1A1TSHR
SCHEMBL16917822 0.90 HTR1B (0.42) HPRT1SLC6A4SLC6A3ALDH1A1TSHR
SCHEMBL5015496 0.85 CES2 (0.43) HPRT1SLC6A4ALDH1A1TSHRKDM4E
SCHEMBL29618976 0.85 CES2 (0.43) HPRT1SLC6A4ALDH1A1TSHRKDM4E
SCHEMBL4219687 0.83 SLC6A4 (0.37) HPRT1SLC6A4SLC6A3ALDH1A1TSHR
SCHEMBL4074883 0.83 ALDH1A1 (0.52) HPRT1SLC6A4SLC6A3ALDH1A1TSHR
SCHEMBL423873 0.83 CYP1A2 (0.68) HPRT1SLC6A4SLC6A3ALDH1A1TSHR
SCHEMBL2526944 0.83 HPRT1 (0.37) HPRT1SLC6A4SLC6A3ALDH1A1TSHR
SCHEMBL484933 0.83 IDO1 (0.68) TSHRKDM4EMPIL3MBTL1HSD17B10
SCHEMBL19016682 0.83 HPRT1 (0.37) HPRT1SLC6A4SLC6A3ALDH1A1TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 27 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20240004296-A1 RESIST UNDERLAYER FILM-FORMING COMPOSITION NISSAN CHEMICAL CORPORATION (JP) 2024-01-04 US disclosed
CN-116419937-A Composition for forming resist underlayer film 日产化学株式会社 2023-07-11 CN disclosed
CN-115991815-A Halogenated modified prepared photoresist resin material and preparation method thereof 中国科学院长春应用化学研究所 2023-04-21 CN disclosed
WO-2022107759-A1 RESIST UNDERLAYER FILM-FORMING COMPOSITION 日産化学株式会社 2022-05-27 WO disclosed
US-10793584-B2 Naphthobischalcogenadiazole derivative and production method therefor OSAKA UNIVERSITY (JP) 2020-10-06 US disclosed
US-20190337966-A1 NAPHTHOBISCHALCOGENADIAZOLE DERIVATIVE AND PRODUCTION METHOD THEREFOR OSAKA UNIVERSITY (JP) 2019-11-07 US disclosed
EP-3564245-A1 NAPHTHOBISCHALCOGENADIAZOLE DERIVATIVE AND PRODUCTION METHOD THEREFOR Osaka University (JP) 2019-11-06 EP disclosed
WO-2018123207-A1 NAPHTHOBISCHALCOGENADIAZOLE DERIVATIVE AND PRODUCTION METHOD THEREFOR 国立大学法人大阪大学 2018-07-05 WO disclosed
EP-1122746-B1 Composition for film formation and insulating film JSR CORP (JP) 2004-09-22 EP disclosed
EP-1167372-B1 2,2-(Diaryl)vinylphosphine compound, palladium catalyst thereof, and process for producing arylamine, diaryl, or arylalkyne with the catalyst TAKASAGO PERFUMERY CO LTD (JP) 2003-12-10 EP disclosed
US-6277519-B1 QUENCHING AN ALLOY MELT; COMMINUTION SHIN-ETSU CHEMICAL CO., LTD. (JP) 2001-08-21 US disclosed
US-20010012870-A1 Composition for film formation and insulating film JSR CORPORATION (JP) 2001-08-09 US disclosed
EP-1122746-A1 Composition for film formation and insulating film JSR Corporation (JP) 2001-08-08 EP disclosed
US-6096144-A TREATING WITH ACIDIC OR ALKALINE SOLUTION OF CONJUGATED UNSATURATED COMPOUND WITH AT LEAST 5 BONDS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2000-08-01 US disclosed
US-5858571-A TREATING A PULVERIZED HYDROGEN ABSORBING ALLOY WITH A SOLUTION COMPRISING A CONJUGATED UNSATURATED COMPOUND SHIN-ETSU CHEMICAL CO., LTD. (JP) 1999-01-12 US disclosed
EP-0872903-A1 Method for making hydrogen storage alloy powder and electrode comprising the alloy powder Shin-Etsu Chemical Co., Ltd. (JP) 1998-10-21 EP disclosed
EP-0172427-B1 PROCESS FOR PRODUCTION OF VINYL CHLORIDE POLYMER Shin-Etsu Chemical Co., Ltd. (JP) 1989-07-05 EP disclosed
US-4758639-A Process for production of vinyl polymer SHIN-ETSU CHEMICAL CO., LTD. (JP) 1988-07-19 US disclosed
US-4757124-A Suspension or emulsion polymerizing vinyl chloride monomer or mixture of vinyl chloride with vinyl monomer copolymerizable therewith in reactor with walls coated with antiscaling compound containing dye or pigments SHIN-ETSU CHEMICAL CO., LTD. (JP) 1988-07-12 US disclosed
EP-0172427-A2 Process for production of vinyl chloride polymer Shin-Etsu Chemical Co., Ltd. (JP) 1986-02-26 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-10793584-B2 Naphthobischalcogenadiazole derivative and production method therefor CYP24A1, CYP26B1, CYP21A2 HPRT1 707/4885SLC6A4 1164/4885SLC6A3 293/4885
US-20190337966-A1 NAPHTHOBISCHALCOGENADIAZOLE DERIVATIVE AND PRODUCTION METHOD THEREFOR CYP24A1, CYP26B1, CYP21A2 HPRT1 707/4885SLC6A4 1164/4885SLC6A3 293/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.