SCHEMBL3038430

SCHEMBL3038430

CCCCOC(=O)C(C)OCCC

nearest known ligand 0.50

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 3/20 0.50
ATM Q13315 1/20 0.47
TSHR P16473 5/20 0.44
HPGD P15428 2/20 0.44
HCAR2 Q8TDS4 1/20 0.41
NAAA Q02083 1/20 0.41
L3MBTL1 Q9Y468 2/20 0.40
TDP1 Q9NUW8 1/20 0.40
SMN1; SMN2 Q16637 2/20 0.39
NPC1 O15118 1/20 0.39
RAB9A P51151 1/20 0.39
NPSR1 Q6W5P4 2/20 0.39
MAPT P10636 1/20 0.39
EPHX1 P07099 1/20 0.38
LMNA P02545 1/20 0.38
ESR1 P03372 1/20 0.38
CYP1A2 P05177 1/20 0.38
CYP2D6 P10635 1/20 0.38
MAPK1 P28482 1/20 0.38
CYP2C19 P33261 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13715542 0.94 ALDH1A1 (0.52) ALDH1A1ATMTSHRHPGDHCAR2
SCHEMBL445760 0.94 ALDH1A1 (0.52) ALDH1A1ATMTSHRHPGDHCAR2
SCHEMBL446645 0.92 ALDH1A1 (0.45) ALDH1A1ATMTSHRHPGDHCAR2
SCHEMBL3027521 0.89 HCAR2 (0.39) ALDH1A1ATMTSHRHCAR2NAAA
SCHEMBL448441 0.88 ALDH1A1 (0.50) ALDH1A1ATMTSHRHPGDHCAR2
SCHEMBL24823527 0.86 NAAA (0.53) ALDH1A1TSHRHCAR2NAAANPC1
SCHEMBL7200378 0.86 NAAA (0.53) ALDH1A1TSHRHCAR2NAAANPC1
SCHEMBL446065 0.83 ALDH1A1 (0.45) ALDH1A1ATMTSHRHPGDHCAR2
SCHEMBL14570068 0.83 ALDH1A1 (0.45) ALDH1A1ATMTSHRHPGDHCAR2
SCHEMBL3027745 0.83 ALDH1A1 (0.40) ALDH1A1HPGDHCAR2L3MBTL1TDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8409783-B2 Copolymer, resin composition, spacer for display panel, planarization film, thermosetting protective film, microlens, and process for producing copolymer TOKYO OHKA KOGYO CO., LTD. (JP) 2013-04-02 US disclosed
US-20100209847-A1 COPOLYMER, RESIN COMPOSITION, SPACER FOR DISPLAY PANEL, PLANARIZATION FILM, THERMOSETTING PROTECTIVE FILM, MICROLENS, AND PROCESS FOR PRODUCING COPOLYMER TOKYO OHKA KOGYO CO., LTD. (JP) 2010-08-19 US disclosed
US-7713680-B2 Radiation sensitive resin composition for forming a protective film, method of forming a protective film from the composition, liquid crystal display device and solid-state image sensing device JSR CORPORATION (JP) 2010-05-11 US disclosed
US-20080233515-A1 RADIATION SENSITIVE RESIN COMPOSITION FOR FORMING A PROTECTIVE FILM, METHOD OF FORMING A PROTECTIVE FILM FROM THE COMPOSITION, LIQUID CRYSTAL DISPLAY DEVICE AND SOLID-STATE IMAGE SENSING DEVICE JSR CORPORATION (JP) 2008-09-25 US disclosed
EP-1972673-A1 Radiation sensitive resin composition for forming a protective film, method of forming a protective film from the composition, liquid crystal display device and solid-state image sensing device JSR Corporation (JP) 2008-09-24 EP disclosed
CN-1765948-A Side chain unsaturated polymer, radiation sensitive resin composition and spacer for liquid crystal display element JSR CORP (JP) 2006-05-03 CN disclosed
EP-1632794-A2 Radiation sensitive resin composition for forming microlens JSR Corporation (JP) 2006-03-08 EP disclosed
US-20060008735-A1 Radiation sensitive resin composition for forming microlens JSR CORPORATION (JP) 2006-01-12 US disclosed
US-6168908-B1 COATING AN ALKALI-SOLUBLE THERMOSETTING RESIN ON A SUBSTRATE, AND BAKING IT, COATING A RADIATION SENSITIVE RESIN ON THE COATED FILM, AND BAKING, EXPOSING THE RADIATION SENSITIVE FILM TO A RADIATION THROUGH A MASK AND BAKING, DEVELOPING JSR CORPORATION (JP) 2001-01-02 US disclosed
EP-0908780-A1 Process for forming a cured film of a thermosetting resin JSR Corporation (JP) 1999-04-14 EP disclosed