SCHEMBL446645

SCHEMBL446645

CCCCOC(C)C(=O)OCCC

nearest known ligand 0.45

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 4/20 0.45
ATM Q13315 1/20 0.42
TSHR P16473 5/20 0.39
HPGD P15428 2/20 0.39
ESR1 P03372 3/20 0.38
LMNA P02545 2/20 0.38
CYP1A2 P05177 2/20 0.38
CYP2C19 P33261 2/20 0.38
SMN1; SMN2 Q16637 2/20 0.38
CYP2D6 P10635 1/20 0.38
MAPK1 P28482 1/20 0.38
NR1H2 P55055 1/20 0.38
RNASEL Q05823 1/20 0.38
HCAR2 Q8TDS4 1/20 0.37
CYP3A4 P08684 1/20 0.37
CYP2C9 P11712 1/20 0.37
PDE4D Q08499 1/20 0.37
NAAA Q02083 1/20 0.36
DGKA P23743 1/20 0.36
TDP1 Q9NUW8 2/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL445760 0.94 ALDH1A1 (0.52) ALDH1A1ATMTSHRHPGDESR1
SCHEMBL13715542 0.94 ALDH1A1 (0.52) ALDH1A1ATMTSHRHPGDESR1
SCHEMBL3038430 0.92 ALDH1A1 (0.50) ALDH1A1ATMTSHRHPGDESR1
SCHEMBL3027521 0.89 HCAR2 (0.39) ALDH1A1ATMTSHRESR1LMNA
SCHEMBL14570068 0.88 ALDH1A1 (0.45) ALDH1A1ATMTSHRHPGDESR1
SCHEMBL446065 0.88 ALDH1A1 (0.45) ALDH1A1ATMTSHRHPGDESR1
SCHEMBL7200378 0.86 NAAA (0.53) ALDH1A1TSHRLMNAHCAR2NAAA
SCHEMBL9515904 0.83 CA1 (0.47) ALDH1A1ATMTSHRHPGDESR1
SCHEMBL12309039 0.83 CA1 (0.47) ALDH1A1ATMTSHRHPGDESR1
SCHEMBL448441 0.83 ALDH1A1 (0.50) ALDH1A1ATMTSHRHPGDESR1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 655 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-104536265-A Photoresist composition ZHEJIANG YONGTAI TECHNOLOGY CO LTD 2015-04-22 CN claimed
CN-103857751-A Composition for preparing alignment layer, alignment layer prepared therefrom, and retardation film DONGWOO FINE CHEM CO LTD 2014-06-11 CN claimed
CN-100429248-C Manufacturing method of acrylic copolymer resin for layer insulation film for TFT-LCD DONGJIN SAEMIGUNG CO LTD (KR) 2008-10-29 CN claimed
CN-101059653-A Photosensitive resin composition DONGJIN SEMICHEM CO LTD (KR) 2007-10-24 CN claimed
CN-1693322-A Manufacturing method of acrylic copolymer resin for layer insulation film for TFT-LCD DONGJIN SAEMIGUNG CO LTD (KR) 2005-11-09 CN claimed
US-12637529-B2 Resin composition and display device using the same SAMSUNG DISPLAY CO., LTD. (KR) 2026-05-26 US disclosed
WO-2025071108-A1 RESIN COMPOSITION FOR ANTI-REFLECTIVE FILM, ANTI-REFLECTIVE FILM, AND SOLID-STATE IMAGING DEVICE 동우 화인켐 주식회사 2025-04-03 WO disclosed
CN-119065043-A Composition, optical film, layer, optical filter, optical element, solid-state imaging device, and camera module JSR株式会社 2024-12-03 CN disclosed
CN-109976097-B Method of forming micropattern and substrate processing apparatus 三星电子株式会社 2024-06-18 CN disclosed
CN-110007563-B Negative photosensitive resin composition, spacer, protective film, and liquid crystal display element 奇美实业股份有限公司 2024-04-02 CN disclosed
CN-111324013-B Chemically amplified positive photosensitive resin composition and application thereof 奇美实业股份有限公司 2023-12-01 CN disclosed
CN-116648671-A Negative photosensitive resin composition capable of realizing low-temperature curing and low refractive index 株式会社东进世美肯 2023-08-25 CN disclosed
US-6399267-B1 COPOLYMER CONTAINING UNSATURATED CARBOXY ACID OR ANHYDRIDE AND MONOMER OF EPOXY CONTAINING ACRYLIC ESTER JSR CORPORATION (JP) 2002-06-04 US disclosed
US-20020055059-A1 Radiation sensitive resin composition, cathode separator and el display device JSR CORPORATION (JP) 2002-05-09 US disclosed
EP-1193557-A1 Use of a radiation sensitive resin composition for the formation of cathode separator, cathode separator and electroluminescent display device JSR Corporation (JP) 2002-04-03 EP disclosed
US-20010044075-A1 Radiation sensitive resin composition for forming barrier ribs for an EL display element, barrier rib and EL display element JSR CORPORATION (JP) 2001-11-22 US disclosed
EP-1150165-A1 Radiation sensitive resin composition for forming barrier ribs for an el display element, barrier ribs and el display element JSR Corporation (JP) 2001-10-31 EP disclosed
US-6168908-B1 COATING AN ALKALI-SOLUBLE THERMOSETTING RESIN ON A SUBSTRATE, AND BAKING IT, COATING A RADIATION SENSITIVE RESIN ON THE COATED FILM, AND BAKING, EXPOSING THE RADIATION SENSITIVE FILM TO A RADIATION THROUGH A MASK AND BAKING, DEVELOPING JSR CORPORATION (JP) 2001-01-02 US disclosed
EP-1057859-A2 Radiation sensitive resin composition and use of the same in an interlaminar insulating film JSR Corporation (JP) 2000-12-06 EP disclosed
EP-0908780-A1 Process for forming a cured film of a thermosetting resin JSR Corporation (JP) 1999-04-14 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-12637529-B2 Resin composition and display device using the same JMJD6, ALKBH2, ARID2 ALDH1A1 209/4885ATM 502/4885TSHR 3217/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.