Known targets — ChEMBL curated mechanism
ACHECHRM1CHRM3CHRNA1CHRNB1CHRNDCHRNECHRNG
The experimentally established mechanism targets of Biphenyl. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | PTPN1 | P18031 | 4/20 | 0.56 |
| ▸ | PTPN5 | P54829 | 2/20 | 0.45 |
| ▸ | KIF11 | P52732 | 1/20 | 0.44 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.43 |
| ▸ | TSHR | P16473 | 1/20 | 0.42 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.42 |
| ▸ | CA1 | P00915 | 2/20 | 0.41 |
| ▸ | CA2 | P00918 | 2/20 | 0.41 |
| ▸ | CA9 | Q16790 | 2/20 | 0.41 |
| ▸ | CA12 | O43570 | 1/20 | 0.41 |
| ▸ | CA5A | P35218 | 1/20 | 0.40 |
| ▸ | MMP2 | P08253 | 1/20 | 0.39 |
| ▸ | MMP7 | P09237 | 1/20 | 0.39 |
| ▸ | MMP14 | P50281 | 1/20 | 0.39 |
| ▸ | HDAC6 | Q9UBN7 | 2/20 | 0.39 |
| ▸ | MEN1 | O00255 | 1/20 | 0.39 |
| ▸ | GAA | P10253 | 1/20 | 0.39 |
| ▸ | MAPT | P10636 | 1/20 | 0.39 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.39 |
| ▸ | HTT | P42858 | 1/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Biphenyl SCHEMBL1050411 | 0.98 | PTPN1 (0.58) | PTPN1PTPN5KIF11ALDH1A1TSHR | |
| Biphenyl SCHEMBL5410059 | 0.95 | PTPN1 (0.56) | PTPN1PTPN5KIF11ALDH1A1TSHR | |
| Biphenyl SCHEMBL2192409 | 0.95 | PTPN1 (0.56) | PTPN1PTPN5KIF11ALDH1A1TSHR | |
| Biphenyl SCHEMBL27838332 | 0.91 | PTPN1 (0.53) | PTPN1PTPN5KIF11ALDH1A1TSHR | |
| Biphenyl SCHEMBL30131105 | 0.88 | PTPN1 (0.47) | PTPN1PTPN5KIF11ALDH1A1TSHR | |
| Trifluoromethanesulfonic Acid SCHEMBL27707915 | 0.86 | PTPN1 (0.53) | PTPN1PTPN5KIF11CA1CA2 | |
| Trifluoromethanesulfonic Acid SCHEMBL31473545 | 0.86 | PTPN1 (0.53) | PTPN1PTPN5KIF11CA1CA2 | |
| Biphenyl SCHEMBL10617373 | 0.82 | ALDH1A1 (0.56) | PTPN1ALDH1A1TSHRSMN1; SMN2CA1 | |
| Trifluoromethanesulfonic Acid SCHEMBL789189 | 0.82 | ALDH1A1 (0.50) | PTPN1ALDH1A1TSHRSMN1; SMN2CA1 | |
| Trifluoromethanesulfonic Acid SCHEMBL30552135 | 0.82 | ALDH1A1 (0.50) | PTPN1ALDH1A1TSHRSMN1; SMN2CA1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 224 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2026107261-A1 | PURIFICATION OF PHOTORESIST POLYMER BY SURFACE-MODIFIED POROUS POLYETHYLENE MEMBRANE | ENTEGRIS, INC. (US) | 2026-05-21 | — | — | WO | claimed |
| CN-114815505-A | Chemical amplification photoresist composition based on acid-sensitive epoxy monomer and application thereof | 烯欧途(杭州)新材料科技有限公司 | 2022-07-29 | — | — | CN | claimed |
| CN-111234054-B | Double-effect initiator and photopolymerization and thermal polymerization method | 山东非金属材料研究所 | 2022-03-22 | — | — | CN | claimed |
| CN-112624957-A | Synthetic method of 3-alkyl isoindolinone derivatives | 江苏食品药品职业技术学院 | 2021-04-09 | — | — | CN | claimed |
| CN-111484529-A | Method for synthesizing tenofovir monophenyl ester | 奥锐特药业股份有限公司 | 2020-08-04 | — | — | CN | claimed |
| CN-107382820-B | Synthetic method of 3-aryl isoindole derivative | Changzhou University (CN) | 2019-12-06 | — | — | CN | claimed |
| EP-2850139-B1 | RADIATION RADICALLY AND CATIONICALLY CURABLE COMPOSITION, AND METHOD FOR PREPARING A HYBRID SOL-GEL LAYER ON A SURFACE OF A SUBSTRATE USING SAID COMPOSITION | UNIV HAUTE ALSACE (FR) | 2019-05-15 | — | — | EP | claimed |
| EP-2850140-B1 | RADIATION CURABLE COMPOSITION, AND METHOD FOR PREPARING A HYBRID SOL-GEL LAYER ON A SURFACE OF A SUBSTRATE USING SAID COMPOSITION | UNIVERSITÉ DE HAUTE ALSACE (FR) | 2016-07-06 | — | — | EP | claimed |
| EP-2850139-A1 | RADIATION RADICALLY AND CATIONICALLY CURABLE COMPOSITION, AND METHOD FOR PREPARING A HYBRID SOL-GEL LAYER ON A SURFACE OF A SUBSTRATE USING SAID COMPOSITION | Université de Haute Alsace (FR) | 2015-03-25 | — | — | EP | claimed |
| EP-2850140-A1 | RADIATION CURABLE COMPOSITION, AND METHOD FOR PREPARING A HYBRID SOL-GEL LAYER ON A SURFACE OF A SUBSTRATE USING SAID COMPOSITION | Université de Haute Alsace (FR) | 2015-03-25 | — | — | EP | claimed |
| US-20080176678-A1 | Compositions for Use in Golf Balls | ACUSHNET COMPANY | 2008-07-24 | — | — | US | claimed |
| US-6627382-B2 | Includes perfluoro-2,2-dimethy-1,3-dioxole derivatives and vinyl derivatives; for F2 excimer laser | SAMSUNG ELECTRONICS, CO., LTD. (KR) | 2003-09-30 | — | — | US | claimed |
| US-20020177067-A1 | Fluoro-containing photosensitive polymer and photoresist composition containing the same | SAMSUNG ELECTRONICS CO., LTD. | 2002-11-28 | — | — | US | claimed |
| EP-0234327-B1 | High resolution photoresist of imide containing polymers | HOECHST CELANESE CORP (US) | 1994-04-13 | — | — | EP | claimed |
| EP-0453126-A2 | Negative photoresist developable in aqueous base | HOECHST CELANESE CORPORATION (US) | 1991-10-23 | — | — | EP | claimed |
| EP-0410794-A2 | Maleimide containing, negative working deep UV photoresist | HOECHST CELANESE CORPORATION (US) | 1991-01-30 | — | — | EP | claimed |
| US-4968581-A | High resolution photoresist of imide containing polymers | HOECHST CELANESE CORPORATION (US) | 1990-11-06 | — | — | US | claimed |
| US-4912018-A | High resolution photoresist based on imide containing polymers | HOECHST CELANESE CORPORATION (US) | 1990-03-27 | — | — | US | claimed |
| US-4837124-A | High resolution photoresist of imide containing polymers | HOECHST CELANESE CORPORATION (US) | 1989-06-06 | — | — | US | claimed |
| EP-0234327-A2 | High resolution photoresist of imide containing polymers | HOECHST CELANESE CORPORATION (US) | 1987-09-02 | — | — | EP | claimed |