SCHEMBL30529

SCHEMBL30529

C=C(CCc1ccccc1)C(=O)O

nearest known ligand 0.61

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KEAP1 Q14145 1/20 0.61
ALDH1A1 P00352 2/20 0.57
FFAR1 O14842 2/20 0.57
HDAC2 Q92769 3/20 0.53
HDAC8 Q9BY41 3/20 0.53
HDAC6 Q9UBN7 3/20 0.53
TDP1 Q9NUW8 3/20 0.53
HDAC1 Q13547 5/20 0.52
HDAC3 O15379 2/20 0.52
HDAC4 P56524 2/20 0.52
HDAC7 Q8WUI4 2/20 0.52
HDAC10 Q969S8 2/20 0.52
HDAC11 Q96DB2 2/20 0.52
HDAC9 Q9UKV0 2/20 0.52
HDAC5 Q9UQL6 2/20 0.52
MAPK1 P28482 1/20 0.52
ADRA1A P35348 1/20 0.52
SLC6A3 Q01959 1/20 0.52
SMN1; SMN2 Q16637 1/20 0.52
MAPT P10636 2/20 0.50

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL17940817 0.96 FFAR1 (0.64) KEAP1ALDH1A1FFAR1HDAC2HDAC8
Succinic Acid SCHEMBL14801749 0.94 KEAP1 (0.67) KEAP1ALDH1A1FFAR1HDAC2HDAC8
Methacrylic Acid SCHEMBL1082311 0.92 ALDH1A1 (0.60) KEAP1ALDH1A1FFAR1HDAC2HDAC8
SCHEMBL1920994 0.92 FFAR1 (0.55) KEAP1ALDH1A1FFAR1HDAC2HDAC8
SCHEMBL17975817 0.91 FFAR1 (0.53) KEAP1ALDH1A1FFAR1HDAC2HDAC8
SCHEMBL6736208 0.91 ALDH1A1 (0.53) KEAP1ALDH1A1FFAR1HDAC2HDAC8
SCHEMBL3451389 0.89 KEAP1 (0.50) KEAP1ALDH1A1FFAR1HDAC2HDAC8
SCHEMBL480738 0.88 FFAR1 (0.67) KEAP1FFAR1HDAC2HDAC1HTT
SCHEMBL4666437 0.88 HDAC1 (0.64) KEAP1ALDH1A1FFAR1HDAC2HDAC8
SCHEMBL114130 0.88 HDAC1 (0.64) KEAP1ALDH1A1FFAR1HDAC2HDAC8

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Appears in 11899 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4534627-B1 QUANTUM DOT COMPOSITION, METHOD OF MANUFACTURING THE SAME, CURED PRODUCT THEREOF, AND DISPLAY DEVICE INCLUDING THE SAME SAMSUNG ELECTRONICS CO LTD (KR) 2026-05-20 EP claimed
US-20260132302-A1 INKJET INK KYOCERA DOCUMENT SOLUTIONS INC (JP) 2026-05-14 US claimed
US-20260103623-A1 TWO-PART, CYANOACRYLATE/FREE RADICALLY CURABLE ADHESIVE SYSTEMS HENKEL AG & CO KGAA (DE) 2026-04-16 US claimed
EP-4724508-A1 COATING COLOR COMPOSITION Coatex (FR) 2026-04-15 EP claimed
US-20260098164-A1 INKJET INK KYOCERA DOCUMENT SOLUTIONS INC (JP) 2026-04-09 US claimed
EP-4476297-B1 PRESSURE-SENSITIVE ADHESIVE COMPOSITION WITH IMPROVED CHEMICAL RESISTANCE TESA SE (DE) 2026-04-01 EP claimed
EP-4717740-A1 INKJET INK KYOCERA Document Solutions Inc. (JP) 2026-04-01 EP claimed
US-20260085202-A1 INKJET INK KYOCERA DOCUMENT SOLUTIONS INC (JP) 2026-03-26 US claimed
EP-3423506-B1 STYRENE-FREE REACTIVE DILUENTS FOR URETHANE ACRYLATE RESIN COMPOSITIONS DOW GLOBAL TECHNOLOGIES LLC (US) 2026-03-25 EP claimed
EP-3642276-B1 POLYVINYL CHLORIDE COMPOSITIONS CONTAINING IMPACT MODIFIERS AND CALCIUM CARBONATE DOW GLOBAL TECHNOLOGIES LLC (US) 2026-03-25 EP claimed
EP-0082204-B1 PLASTIC LENS WITH HIGH REFRACTIVE INDEX HOYA LENS CORPORATION (JP) 1985-08-21 EP claimed
EP-0115066-A2 Moulding Material based on acrylic resins with slight water absorption Röhm GmbH (DE) 1984-08-08 EP claimed
US-4443588-A THERMOSETTING, UNSATURATED URETHANE TORAY INDUSTRIES, INC. (JP) 1984-04-17 US claimed
US-4405707-A Method of producing relief structures for integrated semiconductor circuits SIEMENS AKTIENGESELLSCHAFT (DE) 1983-09-20 US claimed
EP-0082204-A1 PLASTIC LENS WITH HIGH REFRACTIVE INDEX HOYA LENS CORPORATION (JP) 1983-06-29 EP claimed
US-4388399-A ALCOHOL-SOLUBLE POLYAMIDE BLEND WITH OTHER POLYMER UNDER PHOTORESIST LAYER FUJI PHOTO FILM CO., LTD. (JP) 1983-06-14 US claimed
EP-0059561-A1 Highly refractive urethane polymers for use in optical lenses and lenses prepared therefrom TORAY INDUSTRIES, INC. (JP) 1982-09-08 EP claimed
EP-0006938-B1 POSITIVE TYPE RESIST POLYMER COMPOSITION AND METHOD OF MAKING RESIST PATTERNS FUJITSU LIMITED (JP) 1982-08-04 EP claimed
EP-0006939-B1 POSITIVE TYPE RESIST POLYMER COMPOSITION AND METHOD OF MAKING RESIST PATTERNS FUJITSU LIMITED (JP) 1982-07-28 EP claimed
US-4306780-A Highly refractive copolymer of an ethylinically unsaturated alkylene oxide of bis-phenol-A and an ethylinically unsaturated aromatic compound for lens and a lens prepared therefrom HOYA LENS CORPORATION (JP) 1981-12-22 US claimed