SCHEMBL30535784

SCHEMBL30535784

Cc1cc2ccccc2c(-c2cccc3ccccc23)c1O

nearest known ligand 0.47

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
PTGS1 P23219 1/20 0.46
PTGS2 P35354 1/20 0.46
DHFR P00374 1/20 0.44
ALDH1A1 P00352 3/20 0.44
CYP2A6 P11509 2/20 0.44
CYP1A2 P05177 3/20 0.43
HPGD P15428 2/20 0.43
HSD17B10 Q99714 1/20 0.43
GPR84 Q9NQS5 1/20 0.43
LMNA P02545 1/20 0.43
HTT P42858 1/20 0.43
TLR8 Q9NR97 1/20 0.42
PKM P14618 1/20 0.41
CES1 P23141 1/20 0.40
KDM4E B2RXH2 2/20 0.40
MAPT P10636 2/20 0.40
MEN1 O00255 1/20 0.40
MPI P34949 1/20 0.40
KMT2A Q03164 1/20 0.40
GSK3B P49841 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL31277250 0.85 LMNA (0.52) PTGS1PTGS2ALDH1A1CYP2A6CYP1A2
SCHEMBL3262903 0.85 LMNA (0.52) PTGS1PTGS2ALDH1A1CYP2A6CYP1A2
SCHEMBL31318250 0.85 CYP1A2 (0.52) PTGS1PTGS2ALDH1A1CYP2A6CYP1A2
SCHEMBL5611643 0.85 LMNA (0.50) PTGS1PTGS2DHFRALDH1A1CYP2A6
SCHEMBL9618848 0.85 LMNA (0.50) PTGS1PTGS2CYP2A6CYP1A2LMNA
SCHEMBL30535769 0.83 PTGS1 (0.38) PTGS1PTGS2ALDH1A1CYP2A6CYP1A2
SCHEMBL5178631 0.82 ALDH1A1 (0.47) DHFRALDH1A1CYP2A6CYP1A2HPGD
SCHEMBL30509266 0.82 ALDH1A1 (0.47) DHFRALDH1A1CYP2A6CYP1A2HPGD
SCHEMBL2534631 0.82 ALDH1A1 (0.47) PTGS1PTGS2DHFRALDH1A1CYP2A6
SCHEMBL888517 0.82 TRPM4 (0.48) DHFRALDH1A1CYP1A2HPGDHSD17B10

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3266759-B1 COMPOUND, RESIN, MATERIAL FOR FORMING UNDERLAYER FILM FOR LITHOGRAPHY, UNDERLAYER FILM FOR LITHOGRAPHY, PATTERN FORMING METHOD, AND METHOD FOR PURIFYING COMPOUND OR RESIN MITSUBISHI GAS CHEMICAL CO (JP) 2023-09-13 EP disclosed