Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LMNA | P02545 | 6/20 | 0.46 |
| ▸ | CYP1A2 | P05177 | 3/20 | 0.46 |
| ▸ | CYP3A4 | P08684 | 3/20 | 0.46 |
| ▸ | MAOA | P21397 | 2/20 | 0.46 |
| ▸ | TSHR | P16473 | 3/20 | 0.41 |
| ▸ | CYP2C19 | P33261 | 2/20 | 0.41 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.41 |
| ▸ | PDE4D | Q08499 | 1/20 | 0.41 |
| ▸ | CYP19A1 | P11511 | 2/20 | 0.40 |
| ▸ | HPGD | P15428 | 1/20 | 0.40 |
| ▸ | HTT | P42858 | 1/20 | 0.40 |
| ▸ | MAPT | P10636 | 3/20 | 0.39 |
| ▸ | NPC1 | O15118 | 3/20 | 0.39 |
| ▸ | RAB9A | P51151 | 3/20 | 0.39 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.39 |
| ▸ | CA12 | O43570 | 1/20 | 0.39 |
| ▸ | CA1 | P00915 | 1/20 | 0.39 |
| ▸ | CA2 | P00918 | 1/20 | 0.39 |
| ▸ | CA9 | Q16790 | 1/20 | 0.39 |
| ▸ | CA14 | Q9ULX7 | 1/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL19025142 | 0.80 | MEN1 (0.46) | LMNACYP1A2CYP3A4TSHRCYP2C19 | |
| SCHEMBL27711711 | 0.76 | ALDH1A1 (0.45) | LMNAHPGDMAPTRAB9AALDH1A1 | |
| SCHEMBL11118356 | 0.75 | ALDH1A1 (0.57) | LMNACYP1A2CYP3A4MAOATSHR | |
| SCHEMBL28947561 | 0.74 | LMNA (0.46) | LMNACYP1A2CYP3A4MAOAHPGD | |
| SCHEMBL324128 | 0.74 | HPGD (0.37) | LMNACYP1A2CYP3A4MAOATSHR | |
| SCHEMBL62657 | 0.72 | CA12 (0.59) | LMNACYP1A2CYP3A4MAOAHPGD | |
| SCHEMBL204877 | 0.72 | CA12 (0.59) | LMNACYP1A2CYP3A4MAOAHPGD | |
| SCHEMBL9097535 | 0.72 | CA12 (0.59) | LMNACYP1A2CYP3A4MAOAHPGD | |
| SCHEMBL305564 | 0.71 | LMNA (0.46) | LMNACYP1A2CYP3A4MAOATSHR | |
| SCHEMBL4400075 | 0.70 | AKR1C3 (0.40) | LMNAHPGDMAPTNPC1RAB9A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1114 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-118871861-A | Dry film resist, photosensitive dry film and copper-clad plate | 杭州福斯特电子材料有限公司 | 2024-10-29 | — | — | CN | claimed |
| CN-113341647-B | Dry film resist composition and dry film resist laminate | 杭州福斯特电子材料有限公司 | 2024-05-28 | — | — | CN | claimed |
| CN-117687268-B | Photosensitive resin composition, photosensitive dry film and copper-clad plate | 湖南初源新材料股份有限公司 | 2024-04-19 | — | — | CN | claimed |
| CN-117687268-A | Photosensitive resin composition, photosensitive dry film and copper-clad plate | 湖南初源新材料股份有限公司 | 2024-03-12 | — | — | CN | claimed |
| CN-117008417-A | Photosensitive resin composition, resist material and application | 杭州福斯特电子材料有限公司 | 2023-11-07 | — | — | CN | claimed |
| WO-2023185530-A1 | DRY FILM RESIST, PHOTOSENSITIVE DRY FILM, AND COPPER CLAD LAMINATE | 杭州福斯特电子材料有限公司 | 2023-10-05 | — | — | WO | claimed |
| CN-116560189-A | Photocurable resin composition and application thereof | 杭州福斯特电子材料有限公司 | 2023-08-08 | — | — | CN | claimed |
| CN-116184763-A | Photocurable resin composition and application thereof | 杭州福斯特电子材料有限公司 | 2023-05-30 | — | — | CN | claimed |
| CN-113801291-B | Photosensitive resin composition, photosensitive dry film resist and manufacturing method of PCB | 杭州福斯特电子材料有限公司 | 2023-05-12 | — | — | CN | claimed |
| CN-110471256-B | Photosensitive resin composition | 杭州福斯特电子材料有限公司 | 2023-05-12 | — | — | CN | claimed |
| US-6855480-B2 | Photoresist composition | SHIPLEY COMPANY, L.L.C. (US) | 2005-02-15 | — | — | US | claimed |
| US-6818375-B2 | FOR MANUFACTURING PRINTED WIRING BOARDS | ETERNAL TECHNOLOGY CORPORATION | 2004-11-16 | — | — | US | claimed |
| US-20030059709-A1 | Photoresist composition | SHIPLEY COMPANY, L.L.C. | 2003-03-27 | — | — | US | claimed |
| US-20030022098-A1 | Photoresist composition | SHIPLEY COMPANY, L.L.C. | 2003-01-30 | — | — | US | claimed |
| EP-1251399-A2 | Photoresist composition | Shipley Company LLC (US) | 2002-10-23 | — | — | EP | claimed |
| US-20020132180-A1 | Photoresist composition | SHIPLEY COMPANY, L.L.C. (US) | 2002-09-19 | — | — | US | claimed |
| US-6207347-B1 | URETHANE BIURET OLIGOMER. | NICHIGO-MORTON CO. LTD. (JP) | 2001-03-27 | — | — | US | claimed |
| US-4522913-A | DIACRYLATE OR LOW MOLECULAR WEIGHT OLIGOMER THEROF, POLYMERIC FILLER, AND SENSITTIZER | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 1985-06-11 | — | — | US | claimed |
| US-4451551-A | AROMATIC AMINE CONTAINING AN AZIDE OR SULFONYLAZINE GROUP | HITACHI, LTD. (JP) | 1984-05-29 | — | — | US | claimed |
| EP-0005475-B1 | PROCESS FOR THE PREPARATION OF 4,4'-DIAMINOBENZHYDROL AND ITS SUBSTITUTION PRODUCTS | BAYER AG (DE) | 1981-07-22 | — | — | EP | claimed |