Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LMNA | P02545 | 6/20 | 0.46 |
| ▸ | CYP1A2 | P05177 | 2/20 | 0.46 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.46 |
| ▸ | MAOA | P21397 | 1/20 | 0.46 |
| ▸ | CYP19A1 | P11511 | 2/20 | 0.43 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.43 |
| ▸ | HPGD | P15428 | 1/20 | 0.43 |
| ▸ | HTT | P42858 | 1/20 | 0.43 |
| ▸ | CA12 | O43570 | 1/20 | 0.42 |
| ▸ | CA1 | P00915 | 1/20 | 0.42 |
| ▸ | CA2 | P00918 | 1/20 | 0.42 |
| ▸ | CA9 | Q16790 | 1/20 | 0.42 |
| ▸ | CA14 | Q9ULX7 | 1/20 | 0.42 |
| ▸ | MAPT | P10636 | 2/20 | 0.41 |
| ▸ | NPC1 | O15118 | 2/20 | 0.41 |
| ▸ | RAB9A | P51151 | 1/20 | 0.41 |
| ▸ | POLB | P06746 | 2/20 | 0.39 |
| ▸ | MEN1 | O00255 | 1/20 | 0.39 |
| ▸ | PKM | P14618 | 1/20 | 0.39 |
| ▸ | APEX1 | P27695 | 1/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL27527047 | 0.83 | MAPT (0.58) | LMNAALDH1A1HPGDHTTMAPT | |
| Hydrochloric Acid SCHEMBL27544061 | 0.82 | MAPT (0.56) | LMNAALDH1A1HPGDHTTMAPT | |
| SCHEMBL6654495 | 0.82 | LMNA (0.44) | LMNACYP1A2CYP3A4MAOAALDH1A1 | |
| SCHEMBL377001 | 0.80 | MAPT (0.54) | LMNAALDH1A1HPGDHTTMAPT | |
| SCHEMBL204877 | 0.77 | CA12 (0.59) | LMNACYP1A2CYP3A4MAOAALDH1A1 | |
| SCHEMBL62657 | 0.77 | CA12 (0.59) | LMNACYP1A2CYP3A4MAOAALDH1A1 | |
| SCHEMBL9097535 | 0.77 | CA12 (0.59) | LMNACYP1A2CYP3A4MAOAALDH1A1 | |
| SCHEMBL6323387 | 0.76 | ALDH1A1 (0.76) | LMNACYP1A2CYP3A4MAOAALDH1A1 | |
| SCHEMBL25980381 | 0.76 | ALDH1A1 (0.76) | LMNACYP1A2CYP3A4MAOAALDH1A1 | |
| SCHEMBL10356285 | 0.74 | HSD17B10 (0.54) | ALDH1A1POLBMEN1KMT2ATDP1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1389 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-118871861-A | Dry film resist, photosensitive dry film and copper-clad plate | 杭州福斯特电子材料有限公司 | 2024-10-29 | — | — | CN | claimed |
| CN-118244583-A | Negative photosensitive polyimide precursor resin composition | 深圳先进电子材料国际创新研究院 | 2024-06-25 | — | — | CN | claimed |
| CN-118240213-A | Negative photosensitive polyimide precursor and composition thereof | 深圳先进电子材料国际创新研究院 | 2024-06-25 | — | — | CN | claimed |
| CN-112947001-B | Photosensitive resin composition, dry film resist and manufacturing method of PCB | 杭州福斯特电子材料有限公司 | 2024-05-28 | — | — | CN | claimed |
| CN-113341647-B | Dry film resist composition and dry film resist laminate | 杭州福斯特电子材料有限公司 | 2024-05-28 | — | — | CN | claimed |
| CN-117687268-B | Photosensitive resin composition, photosensitive dry film and copper-clad plate | 湖南初源新材料股份有限公司 | 2024-04-19 | — | — | CN | claimed |
| CN-116909100-B | Photosensitive polyimide precursor composition | 深圳先进电子材料国际创新研究院 | 2024-03-19 | — | — | CN | claimed |
| CN-117687268-A | Photosensitive resin composition, photosensitive dry film and copper-clad plate | 湖南初源新材料股份有限公司 | 2024-03-12 | — | — | CN | claimed |
| CN-117008417-A | Photosensitive resin composition, resist material and application | 杭州福斯特电子材料有限公司 | 2023-11-07 | — | — | CN | claimed |
| CN-116909100-A | Photosensitive polyimide precursor composition | 深圳先进电子材料国际创新研究院 | 2023-10-20 | — | — | CN | claimed |
| US-6855480-B2 | Photoresist composition | SHIPLEY COMPANY, L.L.C. (US) | 2005-02-15 | — | — | US | claimed |
| US-6818375-B2 | FOR MANUFACTURING PRINTED WIRING BOARDS | ETERNAL TECHNOLOGY CORPORATION | 2004-11-16 | — | — | US | claimed |
| US-20030059709-A1 | Photoresist composition | SHIPLEY COMPANY, L.L.C. | 2003-03-27 | — | — | US | claimed |
| US-20030022098-A1 | Photoresist composition | SHIPLEY COMPANY, L.L.C. | 2003-01-30 | — | — | US | claimed |
| EP-1251399-A2 | Photoresist composition | Shipley Company LLC (US) | 2002-10-23 | — | — | EP | claimed |
| US-20020132180-A1 | Photoresist composition | SHIPLEY COMPANY, L.L.C. (US) | 2002-09-19 | — | — | US | claimed |
| US-6207347-B1 | URETHANE BIURET OLIGOMER. | NICHIGO-MORTON CO. LTD. (JP) | 2001-03-27 | — | — | US | claimed |
| US-4451551-A | AROMATIC AMINE CONTAINING AN AZIDE OR SULFONYLAZINE GROUP | HITACHI, LTD. (JP) | 1984-05-29 | — | — | US | claimed |
| EP-0005475-B1 | PROCESS FOR THE PREPARATION OF 4,4'-DIAMINOBENZHYDROL AND ITS SUBSTITUTION PRODUCTS | BAYER AG (DE) | 1981-07-22 | — | — | EP | claimed |
| US-4180404-A | Heat resistant photoresist composition and process for preparing the same | ASAHI KASEI KOGYO KABUSHIKI KAISHA (JP) | 1979-12-25 | — | — | US | claimed |