SCHEMBL305984

SCHEMBL305984

N#CC(=CC(=O)O)c1ccccc1

nearest known ligand 0.50

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 9/20 0.46
CYP1A2 P05177 1/20 0.46
CYP2C9 P11712 1/20 0.46
CYP2C19 P33261 1/20 0.46
SMN1; SMN2 Q16637 1/20 0.45
MAPK1 P28482 4/20 0.45
MAPT P10636 3/20 0.45
RAB9A P51151 3/20 0.45
KMT2A Q03164 2/20 0.45
L3MBTL1 Q9Y468 1/20 0.45
MEN1 O00255 1/20 0.45
KDM4E B2RXH2 2/20 0.44
HPGD P15428 1/20 0.44
CA2 P00918 3/20 0.43
CA4 P22748 2/20 0.43
CA12 O43570 2/20 0.43
CA1 P00915 2/20 0.43
CA9 Q16790 2/20 0.43
CA3 P07451 1/20 0.43
CA6 P23280 1/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL670068 1.00 ALDH1A1 (0.46) ALDH1A1CYP1A2CYP2C9CYP2C19SMN1; SMN2
SCHEMBL19471869 1.00 ALDH1A1 (0.46) ALDH1A1CYP1A2CYP2C9CYP2C19SMN1; SMN2
Hydrochloric Acid SCHEMBL11318740 0.98 ALDH1A1 (0.45) ALDH1A1CYP1A2CYP2C9CYP2C19SMN1; SMN2
SCHEMBL9468123 0.98 ALDH1A1 (0.45) ALDH1A1CYP1A2CYP2C9CYP2C19SMN1; SMN2
SCHEMBL9468126 0.98 ALDH1A1 (0.45) ALDH1A1CYP1A2CYP2C9CYP2C19SMN1; SMN2
SCHEMBL9468108 0.98 ALDH1A1 (0.45) ALDH1A1CYP1A2CYP2C9CYP2C19SMN1; SMN2
Ethane SCHEMBL21462500 0.96 SMN1; SMN2 (0.47) ALDH1A1CYP1A2CYP2C9CYP2C19SMN1; SMN2
SCHEMBL8129608 0.89 NR4A2 (0.46) ALDH1A1CYP1A2CYP2C9CYP2C19SMN1; SMN2
SCHEMBL28615780 0.89 SMN1; SMN2 (0.46) CYP1A2SMN1; SMN2MAPK1MAPTRAB9A
SCHEMBL6744132 0.88 L3MBTL1 (0.42) ALDH1A1CYP1A2CYP2C9CYP2C19SMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1116 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4731727-A1 HALF-WAVE PLATE Merck Patent GmbH (DE) 2026-04-29 EP claimed
EP-4713414-A1 OPTICAL ELEMENT COMPRISING A CHIRAL LC POLYMER FILM Merck Patent GmbH (DE) 2026-03-25 EP claimed
EP-4713413-A1 CHIRAL REACTIVE MESOGEN MIXTURE Merck Patent GmbH (DE) 2026-03-25 EP claimed
WO-2024260930-A1 HALF-WAVE PLATE MERCK PATENT GMBH (DE) 2024-12-26 WO claimed
WO-2024235947-A1 CHIRAL REACTIVE MESOGEN MIXTURE MERCK PATENT GMBH (DE) 2024-11-21 WO claimed
WO-2024235946-A1 OPTICAL ELEMENT COMPRISING A CHIRAL LC POLYMER FILM MERCK PATENT GMBH (DE) 2024-11-21 WO claimed
WO-2024209462-A1 ANTI-BIOFILM POLYMER COMPOSITIONS YISSUM RESEARCH DEVELOPMENT COMPANY OF THE HEBREW UNIVERSITY OF JERUSALEM LTD. (IL) 2024-10-10 WO claimed
CN-116217536-A Synthesis method of jiale musk and catalyst used in synthesis method 山东新和成药业有限公司 2023-06-06 CN claimed
CN-116135893-A Alkali-soluble resin, alkali-soluble resin composition, photo-curing composition and photo-curing product 常州强力电子新材料股份有限公司 2023-05-19 CN claimed
CN-114507158-B Pleuromutilin alpha-cyano cinnamic acid ester compounds with drug-resistant bacteria resisting activity and preparation method and application thereof 广东医科大学附属医院 2023-04-28 CN claimed
US-5702820-A BLEND OF EPOXY RESIN AND UNSATURATED CARBOXYLIC ACID NIPPON KAYAKU KABUSHIKI KAISHA (JP) 1997-12-30 US claimed
EP-0663411-B1 Photo-imaging resist ink and cured product thereof NIPPON KAYAKU KK (JP) 1997-05-28 EP claimed
US-5589554-A BASED ON A 2-CYANOACRYLATE THREE BOND CO., LTD. (JP) 1996-12-31 US claimed
EP-0663411-A1 Photo-imaging resist ink and cured product thereof Nippon Kayaku Kabushiki Kaisha (JP) 1995-07-19 EP claimed
EP-0389427-B1 Compounds containing both uv-absorber and 1-hydrocarbyloxy hindered amine moieties and stabilized compositions CIBA GEIGY AG (CH) 1994-04-27 EP claimed
EP-0563271-A1 UV/EB CURABLE BUTYL COPOLYMERS FOR COATING APPLICATIONS EXXON CHEMICAL PATENTS INC. (US) 1993-10-06 EP claimed
EP-0563251-A1 UV/EB CURABLE BUTYL COPOLYMERS FOR LITHOGRAPHIC AND CORROSION-RESISTANT COATING APPLICATIONS EXXON CHEMICAL PATENTS INC. (US) 1993-10-06 EP claimed
WO-1992011322-A2 UV/EB CURABLE BUTYL COPOLYMERS FOR LITHOGRAPHIC AND CORROSION-RESISTANT COATING APPLICATIONS EXXON CHEMICAL PATENTS INC. (US) 1992-07-09 WO claimed
WO-1992011295-A1 UV/EB CURABLE BUTYL COPOLYMERS FOR COATING APPLICATIONS EXXON CHEMICAL PATENTS INC. (US) 1992-07-09 WO claimed
US-4255301-A HEAT RESISTANCE, PHOTOSTABILITY ARGUS CHEMICAL CORPORATION (US) 1981-03-10 US claimed