Predicted protein targets (top 17)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | PDE10A | Q9Y233 | 3/20 | 0.37 |
| ▸ | TEK | Q02763 | 1/20 | 0.37 |
| ▸ | ADORA2A | P29274 | 6/20 | 0.36 |
| ▸ | ADORA1 | P30542 | 5/20 | 0.36 |
| ▸ | PDE2A | O00408 | 1/20 | 0.36 |
| ▸ | DPP4 | P27487 | 2/20 | 0.35 |
| ▸ | PIK3CD | O00329 | 1/20 | 0.35 |
| ▸ | NR1H2 | P55055 | 1/20 | 0.34 |
| ▸ | NR1H3 | Q13133 | 1/20 | 0.34 |
| ▸ | CASP3 | P42574 | 1/20 | 0.34 |
| ▸ | SENP8 | Q96LD8 | 1/20 | 0.34 |
| ▸ | SENP7 | Q9BQF6 | 1/20 | 0.34 |
| ▸ | SENP6 | Q9GZR1 | 1/20 | 0.34 |
| ▸ | PDE4B | Q07343 | 1/20 | 0.34 |
| ▸ | ALDH1A3 | P47895 | 1/20 | 0.34 |
| ▸ | PIK3CG | P48736 | 1/20 | 0.34 |
| ▸ | MAOB | P27338 | 1/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL16355183 | 0.96 | MAPK10 (0.35) | PDE10ATEKADORA2AADORA1PDE2A | |
| SCHEMBL16355184 | 0.93 | PIK3CD (0.36) | PDE10AADORA2AADORA1PDE2ADPP4 | |
| SCHEMBL16746559 | 0.92 | CASR (0.37) | ADORA2AADORA1PIK3CDNR1H2NR1H3 | |
| SCHEMBL16355187 | 0.86 | KDM4E (0.43) | TEKADORA1 | |
| SCHEMBL16355186 | 0.86 | KDM4E (0.43) | TEKADORA1 | |
| SCHEMBL3101056 | 0.86 | KDM4E (0.39) | PDE10ATEKPDE2APIK3CD | |
| SCHEMBL30358508 | 0.86 | KDM4E (0.39) | PDE10ATEKPDE2APIK3CD | |
| SCHEMBL23816930 | 0.85 | FABP4 (0.35) | — | |
| SCHEMBL30358507 | 0.84 | KDM4E (0.38) | PDE10ATEKADORA2AADORA1PDE2A | |
| SCHEMBL3086363 | 0.84 | KDM4E (0.38) | PDE10ATEKADORA2AADORA1PDE2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 38 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20240317942-A1 | THIOL-CONTAINING COMPOSITION, PHOTOSETTING COMPOSITION, AND THERMOSETTING COMPOSITION | RESONAC CORPORATION (JP) | 2024-09-26 | — | — | US | disclosed |
| EP-4375302-A1 | THIOL-CONTAINING COMPOSITION, PHOTOCURABLE COMPOSITION, AND THERMOSETTING COMPOSITION | Resonac Corporation (JP) | 2024-05-29 | — | — | EP | disclosed |
| WO-2024008805-A1 | HETEROAROMATIC KETONES AND THEIR USE IN RADICAL AND CATIONIC POLYMERIZATION | PHOSUMA PHOTONIC & SUSTAINABLE MATERIALS GMBH (DE) | 2024-01-11 | — | — | WO | disclosed |
| WO-2023003011-A1 | THIOL-CONTAINING COMPOSITION, PHOTOCURABLE COMPOSITION, AND THERMOSETTING COMPOSITION | 昭和電工株式会社 | 2023-01-26 | — | — | WO | disclosed |
| EP-2899241-B1 | PHOTOPOLYMERIZATION METHOD, INK SET, IMAGE FORMATION METHOD, INK COMPOSITION, AND PHOTOPOLYMERIZATION INITIATOR AND WATER-SOLUBLE BIIMIDAZOLE USED THEREIN | FUJIFILM CORP (JP) | 2019-08-28 | — | — | EP | disclosed |
| EP-2154162-B1 | REACTIVE URETHANE COMPOUND HAVING ETHER BOND, CURABLE COMPOSITION AND CURED MATERIAL | SHOWA DENKO KK (JP) | 2019-07-17 | — | — | EP | disclosed |
| US-9371460-B2 | Photopolymerization method, ink set, ink composition, and water-soluble biimidazole | FUJIFILM CORPORATION (JP) | 2016-06-21 | — | — | US | disclosed |
| US-20150148442-A1 | PHOTOPOLYMERIZATION METHOD, INK SET, INK COMPOSITION, AND WATER-SOLUBLE BIIMIDAZOLE | FUJIFILM CORPORATION (JP) | 2015-05-28 | — | — | US | disclosed |
| US-20140374677-A1 | COLORED COMPOSITION, COLORED PHOTOSENSITIVE COMPOSITION, COLOR FILTER AND LIQUID CRYSTAL DISPLAY DEVICE EQUIPPED WITH SAME, ORGANIC EL DISPLAY DEVICE, AND SOLID-STATE IMAGE SENSOR | FUJIFILM CORPORATION (JP) | 2014-12-25 | — | — | US | disclosed |
| EP-1478668-B1 | THIOL COMPOUND, PHOTOPOLYMERIZATION INITIATOR COMPOSITION AND PHOTOSENSITIVE COMPOSITION | SHOWA DENKO KK (JP) | 2013-04-10 | — | — | EP | disclosed |
| EP-1870771-A2 | Photosensitive paste composition, barrier rib prepared using the composition and plasma display panel comprising the barrier rib | Samsung SDI Co., Ltd. (KR) | 2007-12-26 | — | — | EP | disclosed |
| EP-1031579-B1 | Photopolymerization initiator for color filter, photosensitive coloring composition, and color filter | SHOWA DENKO KK (JP) | 2005-07-27 | — | — | EP | disclosed |
| US-20050153231-A1 | Thiol compound, photopolymerization initiator composition and photosensitive composition | SHOWA DENKO K.K. (JP) | 2005-07-14 | — | — | US | disclosed |
| US-20040157140-A1 | Photosensitive coloring composition, color filter using the composition and method of producing the same | SHOWA DENKO K.K. (JP) | 2004-08-12 | — | — | US | disclosed |
| US-6455207-B1 | COLOR FILTER WITH PIXELS ON TRANSPARENT SUBSTRATE COMPRISING PHOTOSENSITIVE COLORING COMPOSITION COMPRISING TRANSPARENT POLYMER SOLUBLE IN SOLVENT OR AQUEOUS ALKALINE SOLUTION, UNSATURATED COMPOUND, PIGMENT, PHOTOPOLYMERIZATION INITIATOR | SHOWA DENKO KABUSHIKI KAISHA (JP) | 2002-09-24 | — | — | US | disclosed |
| EP-1062546-A1 | PROCESS FOR THE CONTINUOUS LIQUID PROCESSING OF PHOTOSENSITIVE COMPOSITIONS HAVING REDUCED LEVELS OF RESIDUES | E.I. DUPONT DE NEMOURS AND COMPANY (US) | 2000-12-27 | — | — | EP | disclosed |
| EP-1031579-A2 | Photopolymerization initiator for color filter, photosensitive coloring composition, and color filter | SHOWA DENKO KABUSHIKI KAISHA (JP) | 2000-08-30 | — | — | EP | disclosed |
| WO-1999046644-A1 | PROCESS FOR THE CONTINUOUS LIQUID PROCESSING OF PHOTOSENSITIVE COMPOSITIONS HAVING REDUCED LEVELS OF RESIDUES | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1999-09-16 | — | — | WO | disclosed |
| US-4749796-A | PHOTORESISTS | HODOGAYA CHEMICAL CO., LTD. (JP) | 1988-06-07 | — | — | US | disclosed |
| EP-0184114-A1 | A xanthene derivative, a production process of the same and a composite for giving an image which includes the same | HODOGAYA CHEMICAL CO., LTD. (JP) | 1986-06-11 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20150148442-A1 | PHOTOPOLYMERIZATION METHOD, INK SET, INK COMPOSITION, AND WATER-SOLUBLE BIIMIDAZOLE | JAK1, SETDB1, CCNI | PDE10A 3542/4885TEK 4071/4885ADORA2A 2944/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.