Predicted protein targets (top 6)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.33 |
| ▸ | NSD2 | O96028 | 1/20 | 0.33 |
| ▸ | MAPT | P10636 | 1/20 | 0.33 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.33 |
| ▸ | ATM | Q13315 | 1/20 | 0.31 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL31474457 | 0.90 | KDM4E (0.41) | KDM4ENSD2MAPTMAPK1ATM | |
| SCHEMBL30679023 | 0.74 | ATM (0.35) | ATMNPSR1 | |
| SCHEMBL27921999 | 0.73 | MAOA (0.43) | MAPT | |
| Hydrogen Sulfide SCHEMBL28009127 | 0.71 | MEN1 (0.41) | KDM4EATMNPSR1 | |
| SCHEMBL31474508 | 0.70 | ATM (0.35) | ATMNPSR1 | |
| SCHEMBL243271 | 0.70 | ATM (0.35) | ATMNPSR1 | |
| SCHEMBL31474497 | 0.70 | MMP2 (0.46) | — | |
| SCHEMBL31474475 | 0.69 | KDM4E (0.44) | KDM4ENSD2MAPTMAPK1 | |
| SCHEMBL28872362 | 0.69 | SLC6A9 (0.42) | KDM4ENSD2MAPTMAPK1 | |
| SCHEMBL30444911 | 0.63 | MAOA (0.32) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-119998727-A | Chemically amplified positive resist composition for improving pattern profile and enhancing etch resistance | YC化学制品株式会社 | 2025-05-13 | — | — | CN | disclosed |
| CN-119827495-A | Method for testing alkali purity, alkali strength and alkali residue by using photoetching machine | 上海微悦芯材新材料有限责任公司 | 2025-04-15 | — | — | CN | disclosed |
| CN-119827496-A | Method for testing acid strength and acid production efficiency by using photoetching machine and application | 上海微悦芯材新材料有限责任公司 | 2025-04-15 | — | — | CN | disclosed |
| CN-117501179-A | Method of using composition containing organic acid compound, lithographic composition containing organic acid compound, and method of manufacturing resist pattern | 默克专利有限公司 | 2024-02-02 | — | — | CN | disclosed |