Predicted protein targets (top 8)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 4/20 | 0.37 |
| ▸ | USP2 | O75604 | 1/20 | 0.33 |
| ▸ | MAPT | P10636 | 1/20 | 0.33 |
| ▸ | THRB | P10828 | 1/20 | 0.32 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.31 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.31 |
| ▸ | GAA | P10253 | 1/20 | 0.31 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL183807 | 0.90 | TSHR (0.42) | TSHRUSP2MAPTTHRBCYP1A2 | |
| SCHEMBL5968073 | 0.87 | TSHR (0.40) | TSHRUSP2MAPTTHRBCYP1A2 | |
| SCHEMBL12646617 | 0.85 | TSHR (0.31) | TSHR | |
| SCHEMBL2611522 | 0.85 | TSHR (0.37) | TSHRTHRBALDH1A1 | |
| SCHEMBL3440177 | 0.85 | TSHR (0.42) | TSHRUSP2MAPTTHRBCYP1A2 | |
| SCHEMBL712581 | 0.84 | TSHR (0.44) | TSHRUSP2MAPTTHRBCYP1A2 | |
| SCHEMBL285648 | 0.84 | TSHR (0.44) | TSHRUSP2MAPTTHRBCYP1A2 | |
| SCHEMBL2031372 | 0.84 | TSHR (0.44) | TSHRUSP2MAPTTHRBCYP1A2 | |
| SCHEMBL2610391 | 0.82 | TSHR (0.39) | TSHRTHRBALDH1A1 | |
| SCHEMBL1132225 | 0.80 | TSHR (0.44) | TSHRUSP2MAPTTHRBGAA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8313886-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-11-20 | — | — | US | disclosed |
| US-8313886-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-11-20 | — | — | US | disclosed |
| US-8313886-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-11-20 | — | — | US | disclosed |
| US-20100266957-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-10-21 | — | — | US | disclosed |
| US-20100266957-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-10-21 | — | — | US | disclosed |
| US-20100266957-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-10-21 | — | — | US | disclosed |