SCHEMBL308611

SCHEMBL308611

CCCCNC(N)CCC

nearest known ligand 0.39

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
OPRM1 P35372 1/20 0.39
TSHR P16473 2/20 0.36
DPP7 Q9UHL4 3/20 0.35
CA1 P00915 2/20 0.34
CA2 P00918 2/20 0.34
ALOX15 P16050 1/20 0.33
NOD1 Q9Y239 1/20 0.33
RRM1 P23921 1/20 0.32
TLR8 Q9NR97 1/20 0.32
SPHK1 Q9NYA1 1/20 0.32
ADH1B P00325 1/20 0.32
ADH1C P00326 1/20 0.32
ADH1A P07327 1/20 0.32
ADH7 P40394 1/20 0.32
CA12 O43570 1/20 0.32
CA7 P43166 1/20 0.32
CA14 Q9ULX7 1/20 0.32
ALDH1A1 P00352 2/20 0.32
SLC2A1 P11166 1/20 0.32
DPP4 P27487 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL27832222 0.98 OPRM1 (0.37) OPRM1TSHRDPP7CA1CA2
SCHEMBL30226235 0.91 EPHX1 (0.42) OPRM1TSHRDPP7NOD1RRM1
SCHEMBL3447422 0.91 EPHX1 (0.42) OPRM1TSHRDPP7NOD1RRM1
SCHEMBL30266925 0.91 EPHX1 (0.42) OPRM1TSHRDPP7NOD1RRM1
SCHEMBL30266970 0.91 EPHX1 (0.42) OPRM1TSHRDPP7NOD1RRM1
SCHEMBL30226163 0.91 EPHX1 (0.42) OPRM1TSHRDPP7NOD1RRM1
SCHEMBL30267030 0.91 EPHX1 (0.42) OPRM1TSHRDPP7NOD1RRM1
SCHEMBL30267032 0.91 EPHX1 (0.42) OPRM1TSHRDPP7NOD1RRM1
SCHEMBL8644870 0.90 RRM1 (0.36) OPRM1TSHRDPP7NOD1RRM1
Hydrochloric Acid SCHEMBL8084453 0.89 EPHX1 (0.41) OPRM1TSHRDPP7NOD1RRM1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 67 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10920179-B2 Cleaning solution and method for cleaning substrate TOKYO OHKA KOGYO CO., LTD. (JP) 2021-02-16 US disclosed
US-20190256805-A1 CLEANING SOLUTION AND METHOD FOR CLEANING SUBSTRATE TOKYO OHKA KOGYO CO., LTD. (JP) 2019-08-22 US disclosed
US-10119103-B2 Cleaning liquid and method for cleaning TOKYO OHKA KOGYO CO., LTD. (JP) 2018-11-06 US disclosed
US-10030016-B2 Heterocyclic compounds useful as PDK1 inhibitors SUNESIS PHARMACEUTICALS, INC. (US) 2018-07-24 US disclosed
US-20170253840-A1 CLEANING LIQUID AND METHOD FOR CLEANING TOKYO OHKA KOGYO CO., LTD. (JP) 2017-09-07 US disclosed
US-9546165-B2 Heterocyclic compounds useful as PDK1 inhibitors SUNESIS PHARMACEUTICALS, INC. (US) 2017-01-17 US disclosed
US-20160331756-A1 HETEROCYCLIC COMPOUNDS USEFUL AS PDK1 INHIBITORS OXFORD FINANCE LLC, AS COLLATERAL AGENT 2016-11-17 US disclosed
US-20150296646-A1 PROTECTIVE PLATE AND DISPLAY DEVICE SHARP KABUSHIKI KAISHA (JP) 2015-10-15 US disclosed
US-8790990-B2 Silica-based film forming material for formation of air gaps, and method for forming air gaps TOKYO OHKA KOGYO CO., LTD. (JP) 2014-07-29 US disclosed
US-8404786-B2 Polymer and process for producing the same, composition for forming insulating film, and insulating film and method of forming the same JSR CORPORATION (JP) 2013-03-26 US disclosed
US-20030157340-A1 Process for producing silica-based film, silica-based film, insulating film, and semiconductor device JSR CORPORATION (JP) 2003-08-21 US disclosed
US-20020086167-A1 Composition for film formation, method of film formation, and silica-based film JSR CORPORATION (JP) 2002-07-04 US disclosed
US-6413647-B1 USEFUL AS INTERLAYER DIELECTRIC FILM IN SEMICONDUCTOR DEVICES; MECHANICAL STRENGTH JSR CORPORATION (JP) 2002-07-02 US disclosed
US-6410150-B1 Composition for film formation, method of film formation, and insulating film JSR CORPORATION (JP) 2002-06-25 US disclosed
US-6410151-B1 Composition for film formation, method of film formation, and insulating film JSR CORPORATION (JP) 2002-06-25 US disclosed
US-20010018129-A1 Process for producing silica-based film, silica-based film, insulating film, and semiconductor device JSR CORPORATION (JP) 2001-08-30 US disclosed
EP-1127929-A2 Composition for film formation, method of film formation, and silica-based film JSR Corporation (JP) 2001-08-29 EP disclosed
EP-1122770-A2 Silica-based insulating film and its manufacture JSR Corporation (JP) 2001-08-08 EP disclosed
EP-1090967-A2 Composition for film formation, method of film formation, and insulating film JSR Corporation (JP) 2001-04-11 EP disclosed
EP-1088868-A2 Composition for film formation, method of film formation, and insulating film JSR Corporation (JP) 2001-04-04 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-10030016-B2 Heterocyclic compounds useful as PDK1 inhibitors PDK1, PDK2, PDK3 OPRM1 4859/4885TSHR 3323/4885DPP7 794/4885
US-20160331756-A1 HETEROCYCLIC COMPOUNDS USEFUL AS PDK1 INHIBITORS PDK1, PDK2, PDK3 OPRM1 4859/4885TSHR 3323/4885DPP7 794/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.