SCHEMBL3098802

SCHEMBL3098802

CCc1ccc([Si](OC)(OC)OC)cc1

nearest known ligand 0.42

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
TP53 P04637 2/20 0.40
TAAR1 Q96RJ0 1/20 0.39
TUBB1 Q9H4B7 1/20 0.39
CYP2A6 P11509 1/20 0.38
LPL P06858 1/20 0.38
LIPG Q9Y5X9 1/20 0.38
ALDH1A1 P00352 2/20 0.37
PTGS2 P35354 1/20 0.37
TDP1 Q9NUW8 2/20 0.36
SMN1; SMN2 Q16637 2/20 0.35
CA2 P00918 1/20 0.35
TSHR P16473 1/20 0.35
MAPK1 P28482 1/20 0.35
ATM Q13315 1/20 0.35
L3MBTL1 Q9Y468 1/20 0.35
PLAU P00749 1/20 0.34
LMNA P02545 1/20 0.34
CYP2C19 P33261 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6749551 0.90 LPL (0.36) TP53TAAR1TUBB1CYP2A6LPL
SCHEMBL12567351 0.89 TUBB1 (0.36) TP53TAAR1TUBB1CYP2A6LPL
SCHEMBL6748564 0.85 NISCH (0.37) TP53TUBB1LPLLIPGTDP1
SCHEMBL20584032 0.83 LTA4H (0.41) TUBB1ALDH1A1TDP1SMN1; SMN2CA2
SCHEMBL5488548 0.82 LPL (0.42) LPLLIPGALDH1A1CA2L3MBTL1
SCHEMBL50828 0.82 KDM4E (0.32) ALDH1A1SMN1; SMN2CA2MAPK1
SCHEMBL1562733 0.81 TP53 (0.40) TP53TAAR1TUBB1CYP2A6LPL
SCHEMBL4420825 0.79 LTA4H (0.39) SMN1; SMN2CA2TSHR
SCHEMBL4842998 0.79
SCHEMBL3481715 0.79 TP53 (0.39) TP53TAAR1TUBB1CYP2A6LPL

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 58 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-119462728-A Method for preparing 4-trimethoxy silicon-based styrene and application thereof 南通晶爱微电子科技有限公司 2025-02-18 CN claimed
US-5503922-A ADDING SPHERICAL PARTICLES HAVING MULTILAYER CONFIGURATION MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) 1996-04-02 US claimed
CN-119462728-A Method for preparing 4-trimethoxy silicon-based styrene and application thereof 南通晶爱微电子科技有限公司 2025-02-18 CN disclosed
WO-2024190380-A1 SILICON-CONTAINING RESIN COMPOSITION PURIFIED PRODUCT MANUFACTURING METHOD, PATTERN FORMATION METHOD, AND SILICON-CONTAINING RESIN COMPOSITION PURIFIED PRODUCT 東京応化工業株式会社 2024-09-19 WO disclosed
CN-115397356-A Composite tissue markers comprising radiopaque elements detectable by multiple detection means 观点医疗有限公司 2022-11-25 CN disclosed
CN-115334998-A Composite tissue markers detectable by multiple detection modalities 观点医疗有限公司 2022-11-11 CN disclosed
CN-112142660-B Method for simply, conveniently and efficiently synthesizing 4-aryl butyric acid derivative 淮阴师范学院 2021-11-23 CN disclosed
US-20180219160-A1 BENZOBIS(THIADIAZOLE) DERIVATIVE, INK COMPRISING THE SAME, AND ORGANIC ELECTRONIC DEVICE USING THE SAME UBE INDUSTRIES, LTD. (JP) 2018-08-02 US disclosed
US-10025188-B2 Resist pattern-forming method JSR CORPORATION (JP) 2018-07-17 US disclosed
US-20170322492-A1 RESIST PATTERN-FORMING METHOD JSR CORPORATION (JP) 2017-11-09 US disclosed
EP-3181569-A1 BENZOBIS(THIADIAZOLE) DERIVATIVE, INK CONTAINING SAME, AND ORGANIC ELECTRONIC DEVICE USING SAME UBE Industries, Ltd. (JP) 2017-06-21 EP disclosed
US-7964878-B2 Light emitting polymer devices using self-assembled monolayer structures HCF PARTNERS, LP (US) 2011-06-21 US disclosed
US-20100233632-A1 SILICON-CONTAINING FILM-FORMING COMPOSITION, SILICON-CONTAINING FILM, AND PATTERN FORMING METHOD JSR CORPORATION (JP) 2010-09-16 US disclosed
US-20100224317-A1 METHOD FOR FORMING GRAFT POLYMER PATTERN AND METHOD FOR FORMING ELECTRICALLY CONDUCTIVE PATTERN FUJIFILM CORPORATION (JP) 2010-09-09 US disclosed
US-20100178620-A1 INVERTED PATTERN FORMING METHOD AND RESIN COMPOSITION JSR CORPORATION (JP) 2010-07-15 US disclosed
US-20100134052-A1 Light Emitting Polymer Devices Using Self-Assembled Monolayer Structures HCF PARTNERS, L.P. (US) 2010-06-03 US disclosed
US-20100007031-A1 AGENT FOR POST-ETCH TREATMENT OF SILICON DIELECTRIC FILM, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE FUJITSU LIMITED (JP) 2010-01-14 US disclosed
EP-2128897-A1 SILICON DIELECTRIC TREATING AGENT FOR USE AFTER ETCHING, PROCESS FOR PRODUCING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE Fujitsu Limited (JP) 2009-12-02 EP disclosed
US-7291747-B2 Silicon compounds and process for preparation thereof CHISSO CORPORATION (JP) 2007-11-06 US disclosed
US-20040143081-A1 Novel silicon compounds and process for preparation thereof JNC CORPORATION (JP) 2004-07-22 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20180219160-A1 BENZOBIS(THIADIAZOLE) DERIVATIVE, INK COMPRISING THE SAME, AND ORGANIC ELECTRONIC DEVICE USING THE SAME IKZF3, HELZ, TEC TP53 1591/4885TAAR1 2145/4885TUBB1 2105/4885
US-20100134052-A1 Light Emitting Polymer Devices Using Self-Assembled Monolayer Structures CLTB, CYBA, CLTA TP53 3570/4885TAAR1 2531/4885TUBB1 544/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.