Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TEAD1 | P28347 | 1/20 | 0.32 |
| ▸ | TEAD3 | Q99594 | 1/20 | 0.32 |
| ▸ | LMNA | P02545 | 1/20 | 0.32 |
| ▸ | SCN4A | P35499 | 2/20 | 0.31 |
| ▸ | DRD2 | P14416 | 3/20 | 0.31 |
| ▸ | DRD4 | P21917 | 3/20 | 0.31 |
| ▸ | DRD3 | P35462 | 3/20 | 0.31 |
| ▸ | THRB | P10828 | 1/20 | 0.31 |
| ▸ | CASP1 | P29466 | 1/20 | 0.31 |
| ▸ | MTNR1A | P48039 | 2/20 | 0.30 |
| ▸ | MTNR1B | P49286 | 2/20 | 0.30 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3089313 | 0.81 | LMNA (0.39) | LMNASCN4A | |
| SCHEMBL3099048 | 0.80 | SLC6A2 (0.34) | — | |
| SCHEMBL5145957 | 0.70 | AOC3 (0.38) | TEAD1TEAD3 | |
| SCHEMBL11795671 | 0.66 | LMNA (0.47) | LMNASCN4ATHRBMTNR1AMTNR1B | |
| SCHEMBL23239453 | 0.64 | LMNA (0.53) | LMNASCN4ADRD2DRD3MTNR1A | |
| SCHEMBL1042779 | 0.62 | LMNA (0.37) | LMNAMTNR1AMTNR1B | |
| SCHEMBL2168288 | 0.62 | LMNA (0.42) | LMNASCN4ATHRBMTNR1AMTNR1B | |
| SCHEMBL9859418 | 0.62 | LMNA (0.46) | LMNASCN4AMTNR1AMTNR1B | |
| SCHEMBL1044607 | 0.61 | LMNA (0.46) | LMNADRD2DRD4DRD3MTNR1A | |
| SCHEMBL10774207 | 0.61 | PPARG (0.49) | LMNASCN4ATHRBMTNR1AMTNR1B |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7794916-B2 | Positive photosensitive composition, polymer compound used for the positive photosensitive composition, production method of the polymer compound, and pattern forming method using the positive photosensitive composition | FUJIFILM CORPORATION (JP) | 2010-09-14 | — | — | US | disclosed |
| EP-1465010-B1 | Positive resist composition | FUJIFILM CORP (JP) | 2009-10-21 | — | — | EP | disclosed |
| US-20080187863-A1 | POSITIVE PHOTOSENSITIVE COMPOSITION, POLYMER COMPOUND USED FOR THE POSITIVE PHOTOSENSITIVE COMPOSITION, PRODUCTION METHOD OF THE POLYMER COMPOUND, AND PATTERN FORMING METHOD USING THE POSITIVE PHOTOSENSITIVE COMPOSITION | FUJIFILM CORPORATION (JP) | 2008-08-07 | — | — | US | disclosed |
| EP-1925979-A1 | Positive photosensitive composition, polymer compound used for the positive photosensitive composition, production method of the polymer compound, and pattern forming method using the positive photosensitive composition | FUJIFILM Corporation (JP) | 2008-05-28 | — | — | EP | disclosed |
| US-7232640-B1 | Positive resist composition | FUJIFILM CORPORATION (JP) | 2007-06-19 | — | — | US | disclosed |
| US-20070128547-A1 | POSITIVE RESIST COMPOSITION | FUJI PHOTO FILM CO., LTD. | 2007-06-07 | — | — | US | disclosed |
| EP-1465010-A1 | Positive resist composition | FUJI PHOTO FILM CO., LTD. (JP) | 2004-10-06 | — | — | EP | disclosed |