Predicted protein targets (top 16)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LMNA | P02545 | 2/20 | 0.39 |
| ▸ | MEN1 | O00255 | 1/20 | 0.39 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.39 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.38 |
| ▸ | TSHR | P16473 | 1/20 | 0.38 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.38 |
| ▸ | IDO1 | P14902 | 2/20 | 0.36 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.36 |
| ▸ | NPC1 | O15118 | 1/20 | 0.36 |
| ▸ | PKM | P14618 | 1/20 | 0.36 |
| ▸ | EPHX2 | P34913 | 1/20 | 0.36 |
| ▸ | RAB9A | P51151 | 1/20 | 0.36 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.36 |
| ▸ | SCN4A | P35499 | 2/20 | 0.36 |
| ▸ | METAP2 | P50579 | 2/20 | 0.35 |
| ▸ | METAP1 | P53582 | 1/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3099044 | 0.81 | TEAD1 (0.32) | LMNASCN4A | |
| SCHEMBL4066072 | 0.77 | LMNA (0.41) | LMNAMEN1KMT2ACYP2D6TSHR | |
| SCHEMBL3089315 | 0.77 | SLC6A2 (0.39) | MEN1KMT2AIDO1RAB9AMETAP2 | |
| SCHEMBL7809168 | 0.73 | LMNA (0.50) | LMNAMEN1KMT2ACYP2D6TSHR | |
| SCHEMBL5146018 | 0.73 | LMNA (0.40) | LMNAMEN1KMT2ACYP2D6TSHR | |
| SCHEMBL10193007 | 0.73 | SHBG (0.33) | — | |
| SCHEMBL11795671 | 0.72 | LMNA (0.47) | LMNACYP2D6KDM4ENPC1SCN4A | |
| SCHEMBL23239453 | 0.69 | LMNA (0.53) | LMNACYP2D6TSHRKDM4ENPC1 | |
| SCHEMBL1602386 | 0.69 | TP53 (0.33) | LMNAKDM4ESMN1; SMN2 | |
| SCHEMBL6727689 | 0.68 | SCN4A (0.55) | LMNAMEN1KMT2ACYP2D6TSHR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7794916-B2 | Positive photosensitive composition, polymer compound used for the positive photosensitive composition, production method of the polymer compound, and pattern forming method using the positive photosensitive composition | FUJIFILM CORPORATION (JP) | 2010-09-14 | — | — | US | disclosed |
| EP-1465010-B1 | Positive resist composition | FUJIFILM CORP (JP) | 2009-10-21 | — | — | EP | disclosed |
| US-20080187863-A1 | POSITIVE PHOTOSENSITIVE COMPOSITION, POLYMER COMPOUND USED FOR THE POSITIVE PHOTOSENSITIVE COMPOSITION, PRODUCTION METHOD OF THE POLYMER COMPOUND, AND PATTERN FORMING METHOD USING THE POSITIVE PHOTOSENSITIVE COMPOSITION | FUJIFILM CORPORATION (JP) | 2008-08-07 | — | — | US | disclosed |
| EP-1925979-A1 | Positive photosensitive composition, polymer compound used for the positive photosensitive composition, production method of the polymer compound, and pattern forming method using the positive photosensitive composition | FUJIFILM Corporation (JP) | 2008-05-28 | — | — | EP | disclosed |
| US-7232640-B1 | Positive resist composition | FUJIFILM CORPORATION (JP) | 2007-06-19 | — | — | US | disclosed |
| US-20070128547-A1 | POSITIVE RESIST COMPOSITION | FUJI PHOTO FILM CO., LTD. | 2007-06-07 | — | — | US | disclosed |
| EP-1465010-A1 | Positive resist composition | FUJI PHOTO FILM CO., LTD. (JP) | 2004-10-06 | — | — | EP | disclosed |