SCHEMBL3099067

SCHEMBL3099067

CCO[Si](CCCNS(=O)(=O)Cc1ccccc1)(OCC)OCC

nearest known ligand 0.58

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
HPGD P15428 3/20 0.58
ALDH1A1 P00352 3/20 0.58
MEN1 O00255 2/20 0.50
KMT2A Q03164 2/20 0.50
CA1 P00915 1/20 0.50
CA2 P00918 1/20 0.50
MMP1 P03956 1/20 0.50
MMP2 P08253 1/20 0.50
MMP9 P14780 1/20 0.50
MMP8 P22894 1/20 0.50
MMP13 P45452 1/20 0.50
KDM4E B2RXH2 1/20 0.43
POLB P06746 1/20 0.42
MAPT P10636 1/20 0.40
HTT P42858 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3095224 0.91 HPGD (0.54) HPGDALDH1A1MEN1KMT2ACA1
SCHEMBL3103504 0.85 ALDH1A1 (0.57) HPGDALDH1A1MEN1KMT2ACA1
SCHEMBL14150232 0.81 ALDH1A1 (0.58) ALDH1A1KDM4EMAPT
SCHEMBL3110057 0.80 MEN1 (0.39) HPGDALDH1A1MEN1KMT2AKDM4E
SCHEMBL3102149 0.79 MEN1 (0.49) HPGDALDH1A1MEN1KMT2AMMP1
SCHEMBL3099902 0.78 ALDH1A1 (0.37) HPGDALDH1A1MEN1KMT2AKDM4E
SCHEMBL564037 0.78 ALDH1A1 (0.77) HPGDALDH1A1MEN1KMT2ACA1
SCHEMBL9308055 0.78 ALDH1A1 (0.81) HPGDALDH1A1MEN1KMT2ACA1
SCHEMBL3098511 0.77 LMNA (0.40) HPGDALDH1A1MEN1KMT2APOLB
SCHEMBL635209 0.77 ALDH1A1 (0.74) HPGDALDH1A1MEN1KMT2ACA1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9170492-B2 Silicon-containing film-forming composition, silicon-containing film, and pattern forming method JSR CORPORATION (JP) 2015-10-27 US disclosed
US-9140985-B2 2015-09-22 US disclosed
US-20100233632-A1 SILICON-CONTAINING FILM-FORMING COMPOSITION, SILICON-CONTAINING FILM, AND PATTERN FORMING METHOD JSR CORPORATION (JP) 2010-09-16 US disclosed