SCHEMBL3102149

SCHEMBL3102149

CCO[Si](CCNS(=O)(=O)CCc1ccccc1)(OCC)OCC

nearest known ligand 0.50

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 1/20 0.49
KMT2A Q03164 1/20 0.49
L3MBTL1 Q9Y468 1/20 0.46
MMP8 P22894 3/20 0.46
MMP12 P39900 3/20 0.46
MMP13 P45452 3/20 0.46
MMP1 P03956 1/20 0.46
MMP7 P09237 1/20 0.46
RAB9A P51151 3/20 0.44
NPC1 O15118 2/20 0.44
IDO1 P14902 1/20 0.43
POLB P06746 1/20 0.41
ALDH1A1 P00352 1/20 0.41
HPGD P15428 1/20 0.41
GLO1 Q04760 1/20 0.40
PTGES2 Q9H7Z7 1/20 0.39
LMNA P02545 1/20 0.39
CA12 O43570 1/20 0.38
CA7 P43166 1/20 0.38
CA9 Q16790 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3095224 0.87 HPGD (0.54) MEN1KMT2AMMP8MMP13MMP1
SCHEMBL3106739 0.86 NPC1 (0.52) MEN1KMT2AL3MBTL1MMP8MMP12
SCHEMBL3099067 0.79 HPGD (0.58) MEN1KMT2AMMP8MMP13MMP1
SCHEMBL8907383 0.79 MEN1 (0.60) MEN1KMT2AL3MBTL1MMP8MMP12
SCHEMBL15754219 0.77 L3MBTL1 (0.64) MEN1KMT2AL3MBTL1MMP8MMP12
SCHEMBL3836194 0.75 MMP8 (0.58) MEN1KMT2AL3MBTL1MMP8MMP12
SCHEMBL3104005 0.75 MEN1 (0.33) MEN1KMT2ARAB9ALMNA
SCHEMBL107467 0.75 TDP1 (0.43) RAB9ANPC1IDO1ALDH1A1HPGD
SCHEMBL3098822 0.74 RELA (0.40) MEN1KMT2AALDH1A1HPGDLMNA
SCHEMBL16701716 0.72 MMP8 (0.49) MEN1KMT2AL3MBTL1MMP8MMP12

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9170492-B2 Silicon-containing film-forming composition, silicon-containing film, and pattern forming method JSR CORPORATION (JP) 2015-10-27 US disclosed
US-9140985-B2 2015-09-22 US disclosed
US-20100233632-A1 SILICON-CONTAINING FILM-FORMING COMPOSITION, SILICON-CONTAINING FILM, AND PATTERN FORMING METHOD JSR CORPORATION (JP) 2010-09-16 US disclosed