SCHEMBL3098511

SCHEMBL3098511

CCO[Si](CCCNS(=O)(=O)C(=O)c1ccccc1)(OCC)OCC

nearest known ligand 0.40

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
LMNA P02545 2/20 0.40
MAPK1 P28482 2/20 0.40
SMN1; SMN2 Q16637 1/20 0.40
ALDH1A1 P00352 2/20 0.39
NPSR1 Q6W5P4 1/20 0.39
NAAA Q02083 1/20 0.38
CA12 O43570 2/20 0.36
CA9 Q16790 2/20 0.36
RECQL P46063 1/20 0.36
MEN1 O00255 1/20 0.35
KMT2A Q03164 1/20 0.35
POLB P06746 1/20 0.35
TDP1 Q9NUW8 1/20 0.35
TSHR P16473 1/20 0.35
HPGD P15428 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3092305 0.92 LMNA (0.36) LMNAMAPK1SMN1; SMN2ALDH1A1NPSR1
SCHEMBL3108683 0.86 ALDH1A1 (0.40) LMNAMAPK1SMN1; SMN2ALDH1A1NPSR1
SCHEMBL3110057 0.82 MEN1 (0.39) LMNAMAPK1SMN1; SMN2ALDH1A1NPSR1
SCHEMBL29127798 0.79 NAAA (0.60) LMNASMN1; SMN2ALDH1A1NAAARECQL
SCHEMBL3092524 0.78 TSHR (0.40) LMNASMN1; SMN2ALDH1A1NPSR1CA12
SCHEMBL14150232 0.78 ALDH1A1 (0.58) LMNAMAPK1SMN1; SMN2ALDH1A1NPSR1
SCHEMBL3099067 0.77 HPGD (0.58) ALDH1A1MEN1KMT2APOLBHPGD
SCHEMBL29043625 0.75 BCHE (0.43) LMNASMN1; SMN2NAAARECQLKMT2A
SCHEMBL9980885 0.75 NAAA (0.55) LMNASMN1; SMN2ALDH1A1NAAAKMT2A
SCHEMBL5616704 0.74 RAB9A (0.47) LMNASMN1; SMN2ALDH1A1NPSR1MEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9170492-B2 Silicon-containing film-forming composition, silicon-containing film, and pattern forming method JSR CORPORATION (JP) 2015-10-27 US disclosed
US-9140985-B2 2015-09-22 US disclosed
US-20100233632-A1 SILICON-CONTAINING FILM-FORMING COMPOSITION, SILICON-CONTAINING FILM, AND PATTERN FORMING METHOD JSR CORPORATION (JP) 2010-09-16 US disclosed