SCHEMBL3103583

SCHEMBL3103583

CCO[SiH](OCC)C(C)CS

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3685027 0.80
SCHEMBL7528354 0.78 LMNA (0.31)
SCHEMBL125174 0.78 LMNA (0.32)
SCHEMBL441244 0.77 ENPEP (0.30)
Ethane SCHEMBL5834544 0.76 LMNA (0.30)
SCHEMBL7536601 0.75
SCHEMBL1263425 0.74 MAPK1 (0.33)
Ethylene SCHEMBL5834010 0.74
SCHEMBL10697771 0.74 ALDH1A1 (0.32)
SCHEMBL4077417 0.74

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9170492-B2 Silicon-containing film-forming composition, silicon-containing film, and pattern forming method JSR CORPORATION (JP) 2015-10-27 US disclosed
US-9140985-B2 2015-09-22 US disclosed
US-20100233632-A1 SILICON-CONTAINING FILM-FORMING COMPOSITION, SILICON-CONTAINING FILM, AND PATTERN FORMING METHOD JSR CORPORATION (JP) 2010-09-16 US disclosed