SCHEMBL3109795

SCHEMBL3109795

CO[SiH](Cc1ccccc1C(C)C)OC

nearest known ligand 0.42

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
GABRA1 P14867 3/20 0.39
GABRB2 P47870 2/20 0.39
LPAR1 Q92633 3/20 0.37
GABRG2 P18507 2/20 0.36
GABRB3 P28472 2/20 0.36
SLC6A2 P23975 3/20 0.35
CYP1A2 P05177 2/20 0.35
CYP3A4 P08684 2/20 0.35
FAAH O00519 1/20 0.35
CA1 P00915 1/20 0.35
CA2 P00918 1/20 0.35
LMNA P02545 1/20 0.35
HPGD P15428 1/20 0.35
TSHR P16473 1/20 0.35
GABRB1 P18505 1/20 0.35
PTGS1 P23219 1/20 0.35
HTR2C P28335 1/20 0.35
GABRA5 P31644 1/20 0.35
GABRA3 P34903 1/20 0.35
HTR2B P41595 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14841066 0.81 GABRA1 (0.36) GABRA1GABRB2LPAR1GABRG2GABRB3
SCHEMBL2819128 0.75 TAAR1 (0.43) LMNAHPGDTSHRPTGS1MEN1
SCHEMBL9412741 0.75 GABRA1 (0.38) GABRA1GABRB2LMNAHPGDTSHR
SCHEMBL63870 0.75 ALDH1A1 (0.41) SLC6A2CYP1A2CYP3A4HPGDPTGS1
SCHEMBL9968895 0.75 GABRA1 (0.41) GABRA1GABRB2LPAR1GABRG2GABRB3
SCHEMBL2202416 0.73 IDO1 (0.45) SLC6A2LMNASLC6A4SLC6A3
SCHEMBL3337875 0.73 IDO1 (0.52) CA1CA2LMNAL3MBTL1
SCHEMBL963477 0.73 ALDH1A1 (0.34) TSHR
SCHEMBL9839884 0.73 GABRA1 (0.48) GABRA1GABRB2LPAR1GABRG2GABRB3
SCHEMBL28261836 0.73 GABRA1 (0.48) GABRA1GABRB2LPAR1GABRG2GABRB3

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2216682-B1 POSITIVE PHOTOSENSITIVE COMPOSITION, POSITIVE PERMANENT RESIST, AND METHOD FOR PRODUCING POSITIVE PERMANENT RESIST ADEKA CORP (JP) 2013-07-17 EP claimed
CN-107209303-B Far infrared ray reflective film, dispersion for forming far infrared ray reflective film, method for producing far infrared ray reflective film, far infrared ray reflective glass, and window 富士胶片株式会社 2020-07-14 CN disclosed
EP-2216682-B1 POSITIVE PHOTOSENSITIVE COMPOSITION, POSITIVE PERMANENT RESIST, AND METHOD FOR PRODUCING POSITIVE PERMANENT RESIST ADEKA CORP (JP) 2013-07-17 EP disclosed
US-8211619-B2 Positive photosensitive composition, positive permanent resist, and method for producing positive permanent resist ADEKA CORPORATION (JP) 2012-07-03 US disclosed
US-20100273104-A1 POSITIVE PHOTOSENSITIVE COMPOSITION, POSITIVE PERMANENT RESIST, AND METHOD FOR PRODUCING POSITIVE PERMANENT RESIST A D E K A (ADEKA CORPORATION) (JP) 2010-10-28 US disclosed
EP-2216682-A1 POSITIVE PHOTOSENSITIVE COMPOSITION, POSITIVE PERMANENT RESIST, AND METHOD FOR PRODUCING POSITIVE PERMANENT RESIST Adeka Corporation (JP) 2010-08-11 EP disclosed