SCHEMBL3109797

SCHEMBL3109797

CO[Si](C)(OC)c1ccc(C(C)C)cc1

nearest known ligand 0.38

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
SMN1; SMN2 Q16637 3/20 0.38
ALDH1A1 P00352 1/20 0.38
IDO1 P14902 2/20 0.38
NOTUM Q6P988 4/20 0.37
TDP1 Q9NUW8 1/20 0.37
TYR P14679 2/20 0.37
HTT P42858 1/20 0.34
RAB9A P51151 3/20 0.34
HPGD P15428 2/20 0.34
L3MBTL1 Q9Y468 1/20 0.34
MEN1 O00255 1/20 0.34
KMT2A Q03164 1/20 0.34
NPC1 O15118 2/20 0.33
NFKB1 P19838 1/20 0.33
TP53 P04637 1/20 0.33
NPSR1 Q6W5P4 1/20 0.33
KDM4E B2RXH2 1/20 0.32
NISCH Q9Y2I1 1/20 0.32
MGLL Q99685 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5417925 0.84 SLC2A1 (0.36)
SCHEMBL397346 0.83 CA12 (0.30)
SCHEMBL5421307 0.80
SCHEMBL15356148 0.79 ALDH1A1 (0.41) ALDH1A1RAB9AHPGDL3MBTL1NPC1
SCHEMBL28615290 0.79 KMT2A (0.36) ALDH1A1TYRKMT2A
SCHEMBL3110775 0.79 SMN1; SMN2 (0.39) SMN1; SMN2ALDH1A1IDO1NOTUMTDP1
SCHEMBL30423939 0.79 IDO1 (0.42) SMN1; SMN2ALDH1A1IDO1NOTUMTDP1
SCHEMBL4455147 0.76 TDP1 (0.44) SMN1; SMN2ALDH1A1TDP1RAB9AHPGD
SCHEMBL13084774 0.75 TYR (0.42) SMN1; SMN2IDO1NOTUMTYRHTT
SCHEMBL6124152 0.75 TYR (0.42) SMN1; SMN2IDO1NOTUMTYRHTT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2216682-B1 POSITIVE PHOTOSENSITIVE COMPOSITION, POSITIVE PERMANENT RESIST, AND METHOD FOR PRODUCING POSITIVE PERMANENT RESIST ADEKA CORP (JP) 2013-07-17 EP claimed
EP-2216682-B1 POSITIVE PHOTOSENSITIVE COMPOSITION, POSITIVE PERMANENT RESIST, AND METHOD FOR PRODUCING POSITIVE PERMANENT RESIST ADEKA CORP (JP) 2013-07-17 EP disclosed
US-8211619-B2 Positive photosensitive composition, positive permanent resist, and method for producing positive permanent resist ADEKA CORPORATION (JP) 2012-07-03 US disclosed
US-20100273104-A1 POSITIVE PHOTOSENSITIVE COMPOSITION, POSITIVE PERMANENT RESIST, AND METHOD FOR PRODUCING POSITIVE PERMANENT RESIST A D E K A (ADEKA CORPORATION) (JP) 2010-10-28 US disclosed
EP-2216682-A1 POSITIVE PHOTOSENSITIVE COMPOSITION, POSITIVE PERMANENT RESIST, AND METHOD FOR PRODUCING POSITIVE PERMANENT RESIST Adeka Corporation (JP) 2010-08-11 EP disclosed