SCHEMBL3110775

SCHEMBL3110775

CO[Si](OC)(OC)c1ccc(C(C)C)cc1

nearest known ligand 0.39

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
SMN1; SMN2 Q16637 3/20 0.39
ALDH1A1 P00352 1/20 0.39
IDO1 P14902 2/20 0.39
TYR P14679 2/20 0.38
HTT P42858 1/20 0.35
RAB9A P51151 3/20 0.35
HPGD P15428 2/20 0.35
L3MBTL1 Q9Y468 1/20 0.35
MEN1 O00255 1/20 0.35
KMT2A Q03164 1/20 0.35
NFE2L2 Q16236 1/20 0.35
NOTUM Q6P988 3/20 0.34
NPC1 O15118 2/20 0.34
NFKB1 P19838 1/20 0.34
TP53 P04637 1/20 0.34
NPSR1 Q6W5P4 1/20 0.34
TDP1 Q9NUW8 1/20 0.34
NPBWR1 P48145 1/20 0.34
MCHR1 Q99705 1/20 0.34
KDM4E B2RXH2 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5419641 0.83 SLC2A1 (0.38)
SCHEMBL31426900 0.82 ALDH1A1 (0.39) ALDH1A1NFKB1
SCHEMBL22551479 0.82
SCHEMBL31317663 0.82
SCHEMBL50828 0.82 KDM4E (0.32) SMN1; SMN2ALDH1A1KDM4E
SCHEMBL30423939 0.81 IDO1 (0.42) SMN1; SMN2ALDH1A1IDO1TYRHTT
SCHEMBL5404962 0.79
SCHEMBL3109797 0.79 SMN1; SMN2 (0.38) SMN1; SMN2ALDH1A1IDO1TYRHTT
SCHEMBL14573166 0.79 ALDH1A1 (0.42) ALDH1A1RAB9AHPGDL3MBTL1MEN1
SCHEMBL23278559 0.77 HPGD (0.30) HPGD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 16 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-112142660-B Method for simply, conveniently and efficiently synthesizing 4-aryl butyric acid derivative 淮阴师范学院 2021-11-23 CN claimed
CN-112142660-A Method for simply, conveniently and efficiently synthesizing 4-aryl butyric acid derivative 淮阴师范学院 2020-12-29 CN claimed
EP-2216682-B1 POSITIVE PHOTOSENSITIVE COMPOSITION, POSITIVE PERMANENT RESIST, AND METHOD FOR PRODUCING POSITIVE PERMANENT RESIST ADEKA CORP (JP) 2013-07-17 EP claimed
CN-112142660-B Method for simply, conveniently and efficiently synthesizing 4-aryl butyric acid derivative 淮阴师范学院 2021-11-23 CN disclosed
CN-112142660-A Method for simply, conveniently and efficiently synthesizing 4-aryl butyric acid derivative 淮阴师范学院 2020-12-29 CN disclosed
US-10647821-B2 Production process for silicone polymer TORAY FINE CHEMICALS CO., LTD. (JP) 2020-05-12 US disclosed
US-20190023848-A1 PRODUCTION PROCESS FOR SILICONE POLYMER TORAY FINE CHEMICALS CO., LTD. (JP) 2019-01-24 US disclosed
US-20180219160-A1 BENZOBIS(THIADIAZOLE) DERIVATIVE, INK COMPRISING THE SAME, AND ORGANIC ELECTRONIC DEVICE USING THE SAME UBE INDUSTRIES, LTD. (JP) 2018-08-02 US disclosed
EP-3181569-A1 BENZOBIS(THIADIAZOLE) DERIVATIVE, INK CONTAINING SAME, AND ORGANIC ELECTRONIC DEVICE USING SAME UBE Industries, Ltd. (JP) 2017-06-21 EP disclosed
CN-106661057-A Benzobis(thiadiazole) derivative, ink containing same, and organic electronic device using same 宇部兴产株式会社 2017-05-10 CN disclosed
EP-2216682-B1 POSITIVE PHOTOSENSITIVE COMPOSITION, POSITIVE PERMANENT RESIST, AND METHOD FOR PRODUCING POSITIVE PERMANENT RESIST ADEKA CORP (JP) 2013-07-17 EP disclosed
US-8211619-B2 Positive photosensitive composition, positive permanent resist, and method for producing positive permanent resist ADEKA CORPORATION (JP) 2012-07-03 US disclosed
US-20100273104-A1 POSITIVE PHOTOSENSITIVE COMPOSITION, POSITIVE PERMANENT RESIST, AND METHOD FOR PRODUCING POSITIVE PERMANENT RESIST A D E K A (ADEKA CORPORATION) (JP) 2010-10-28 US disclosed
EP-2216682-A1 POSITIVE PHOTOSENSITIVE COMPOSITION, POSITIVE PERMANENT RESIST, AND METHOD FOR PRODUCING POSITIVE PERMANENT RESIST Adeka Corporation (JP) 2010-08-11 EP disclosed
US-7291747-B2 Silicon compounds and process for preparation thereof CHISSO CORPORATION (JP) 2007-11-06 US disclosed
US-20040143081-A1 Novel silicon compounds and process for preparation thereof JNC CORPORATION (JP) 2004-07-22 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20180219160-A1 BENZOBIS(THIADIAZOLE) DERIVATIVE, INK COMPRISING THE SAME, AND ORGANIC ELECTRONIC DEVICE USING THE SAME IKZF3, HELZ, TEC SMN1; SMN2 3469/4885ALDH1A1 246/4885IDO1 159/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.