SCHEMBL3119965

SCHEMBL3119965

O=S(=O)(OS(c1ccccc1)(c1ccccc1)c1ccc(C2CCCCC2)cc1)C(F)(F)CC1CC2CCC1C2

nearest known ligand 0.36

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
LMNA P02545 4/20 0.36
HTT P42858 2/20 0.36
APOBEC3A P31941 1/20 0.35
APOBEC3G Q9HC16 1/20 0.35
MEN1 O00255 5/20 0.34
KMT2A Q03164 5/20 0.34
SMN1; SMN2 Q16637 3/20 0.33
KDM4E B2RXH2 1/20 0.33
MAPK1 P28482 1/20 0.33
HSD17B10 Q99714 1/20 0.33
KDM1A O60341 1/20 0.33
PTGES2 Q9H7Z7 1/20 0.33
TSHR P16473 1/20 0.32
NPSR1 Q6W5P4 1/20 0.32
FAAH O00519 1/20 0.32
ALDH1A1 P00352 2/20 0.31
POLB P06746 1/20 0.31
RECQL P46063 1/20 0.31
THRB P10828 1/20 0.31
DRD2 P14416 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1172106 0.90 MEN1 (0.34) LMNAHTTMEN1KMT2ASMN1; SMN2
SCHEMBL447066 0.82 LMNA (0.39) LMNAHTTAPOBEC3AAPOBEC3GMEN1
SCHEMBL449882 0.79 LMNA (0.44) LMNAHTTAPOBEC3AAPOBEC3GMEN1
SCHEMBL3119957 0.78 LMNA (0.33) LMNAHTTAPOBEC3AAPOBEC3GMEN1
SCHEMBL422297 0.73 LMNA (0.42) LMNAHTTAPOBEC3AAPOBEC3GMEN1
SCHEMBL447487 0.73 LMNA (0.41) LMNAHTTAPOBEC3AAPOBEC3GMEN1
SCHEMBL3129792 0.73 LMNA (0.41) LMNAHTTAPOBEC3AAPOBEC3GMEN1
SCHEMBL2534163 0.71 MEN1 (0.34) LMNAHTTMEN1KMT2ASMN1; SMN2
SCHEMBL3130026 0.70 KDM1A (0.47) LMNAHTTMEN1KMT2ASMN1; SMN2
SCHEMBL383094 0.69 L3MBTL1 (0.35) LMNAHTTMEN1KMT2AKDM4E

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8722306-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2014-05-13 US disclosed
US-20100178608-A1 RADIATION-SENSITIVE RESIN COMPOSITION JSR CORPORATION (JP) 2010-07-15 US disclosed