SCHEMBL3127086

SCHEMBL3127086

O=COCc1cc(OCCCI)ccc1[N+](=O)[O-]

nearest known ligand 0.42

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
MAPT P10636 7/20 0.42
ALDH1A1 P00352 5/20 0.39
LMNA P02545 2/20 0.38
SMN1; SMN2 Q16637 2/20 0.37
DRD2 P14416 1/20 0.36
DRD4 P21917 1/20 0.36
DRD3 P35462 1/20 0.36
TLR4 O00206 1/20 0.34
TLR2 O60603 1/20 0.34
KDM4E B2RXH2 2/20 0.34
MEN1 O00255 2/20 0.34
KMT2A Q03164 2/20 0.34
MAOB P27338 1/20 0.34
MAPK1 P28482 1/20 0.34
RECQL P46063 1/20 0.34
TDP1 Q9NUW8 1/20 0.34
HTT P42858 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL69085 0.81 MAPT (0.46) MAPTALDH1A1LMNASMN1; SMN2TLR4
SCHEMBL67179 0.81 MAPT (0.46) MAPTALDH1A1LMNASMN1; SMN2KDM4E
SCHEMBL66583 0.81 MAPT (0.46) MAPTALDH1A1LMNASMN1; SMN2KDM4E
SCHEMBL3123744 0.80 MAPT (0.40) MAPTALDH1A1LMNASMN1; SMN2KDM4E
SCHEMBL3496181 0.80 MEN1 (0.41) MAPTALDH1A1LMNASMN1; SMN2MEN1
SCHEMBL3127146 0.75 MAPT (0.48) MAPTALDH1A1LMNASMN1; SMN2TLR4
SCHEMBL3124329 0.74 KMT2A (0.50) MAPTALDH1A1LMNAMEN1KMT2A
SCHEMBL3118876 0.74 TSHR (0.51) MAPTALDH1A1LMNAKDM4EKMT2A
SCHEMBL16284329 0.73 MAPT (0.48) MAPTALDH1A1LMNASMN1; SMN2MEN1
SCHEMBL9738695 0.72 MAPT (0.56) MAPTALDH1A1LMNASMN1; SMN2TLR4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7651834-B2 Photosensitive compound, photosensitive composition, method for resist pattern formation, and process for device production CANON KABUSHIKI KAISHA (JP) 2010-01-26 US disclosed
US-20070287105-A1 PHOTOSENSITIVE COMPOUND, PHOTOSENSITIVE COMPOSITION, METHOD FOR RESIST PATTERN FORMATION, AND PROCESS FOR DEVICE PRODUCTION CANON KABUSHIKI KAISHA (JP) 2007-12-13 US disclosed
EP-1865379-A1 Photosensitive compound, photosensitive composition, method for resist pattern formation, and process for device prodution Canon Kabushiki Kaisha (JP) 2007-12-12 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20070287105-A1 PHOTOSENSITIVE COMPOUND, PHOTOSENSITIVE COMPOSITION, METHOD FOR RESIST PATTERN FORMATION, AND PROCESS FOR DEVICE PRODUCTION RER1, C1R, CRY2 MAPT 2153/4885ALDH1A1 2569/4885LMNA 2543/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.