SCHEMBL66583

SCHEMBL66583

O=[N+]([O-])c1ccc(OCCCI)cc1CCl

nearest known ligand 0.46

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
MAPT P10636 7/20 0.46
ALDH1A1 P00352 4/20 0.45
TSHR P16473 1/20 0.45
LMNA P02545 2/20 0.41
SMN1; SMN2 Q16637 4/20 0.37
KMT2A Q03164 4/20 0.37
KDM4E B2RXH2 4/20 0.37
MEN1 O00255 3/20 0.37
MAPK1 P28482 2/20 0.37
RECQL P46063 1/20 0.36
HTT P42858 1/20 0.36
ALPG P10696 1/20 0.36
TDP1 Q9NUW8 1/20 0.36
NPC1 O15118 2/20 0.36
RAB9A P51151 2/20 0.36
SIRT5 Q9NXA8 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL69085 0.86 MAPT (0.46) MAPTALDH1A1LMNASMN1; SMN2KMT2A
SCHEMBL67179 0.86 MAPT (0.46) MAPTALDH1A1LMNASMN1; SMN2KMT2A
SCHEMBL3123744 0.82 MAPT (0.40) MAPTALDH1A1LMNASMN1; SMN2KMT2A
SCHEMBL3127086 0.81 MAPT (0.42) MAPTALDH1A1LMNASMN1; SMN2KMT2A
SCHEMBL3127146 0.79 MAPT (0.48) MAPTALDH1A1LMNASMN1; SMN2KMT2A
SCHEMBL16162779 0.78 MAPT (0.47) MAPTALDH1A1TSHRLMNASMN1; SMN2
SCHEMBL8437108 0.77 ALDH1A1 (0.51) MAPTALDH1A1TSHRLMNASMN1; SMN2
SCHEMBL1589463 0.76 MAPT (0.50) MAPTALDH1A1LMNASMN1; SMN2KMT2A
SCHEMBL7717015 0.76 MAPT (0.51) MAPTALDH1A1LMNASMN1; SMN2KMT2A
SCHEMBL9733343 0.75 ALDH1A1 (0.39) MAPTALDH1A1TSHRLMNAKMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1865379-B1 Method for resist pattern formation, and process for device prodution CANON KK (JP) 2013-01-16 EP disclosed
US-8129087-B2 Block copolymer and substrate processing method CANON KABUSHIKI KAISHA (JP) 2012-03-06 US disclosed
US-7651834-B2 Photosensitive compound, photosensitive composition, method for resist pattern formation, and process for device production CANON KABUSHIKI KAISHA (JP) 2010-01-26 US disclosed
US-20090311637-A1 BLOCK COPOLYMER AND SUBSTRATE PROCESSING METHOD CANON KABUSHIKI KAISHA (JP) 2009-12-17 US disclosed
US-20070287105-A1 PHOTOSENSITIVE COMPOUND, PHOTOSENSITIVE COMPOSITION, METHOD FOR RESIST PATTERN FORMATION, AND PROCESS FOR DEVICE PRODUCTION CANON KABUSHIKI KAISHA (JP) 2007-12-13 US disclosed
EP-1865379-A1 Photosensitive compound, photosensitive composition, method for resist pattern formation, and process for device prodution Canon Kabushiki Kaisha (JP) 2007-12-12 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20070287105-A1 PHOTOSENSITIVE COMPOUND, PHOTOSENSITIVE COMPOSITION, METHOD FOR RESIST PATTERN FORMATION, AND PROCESS FOR DEVICE PRODUCTION RER1, C1R, CRY2 MAPT 2153/4885ALDH1A1 2569/4885TSHR 1221/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.