SCHEMBL69085

SCHEMBL69085

O=[N+]([O-])c1ccc(OCCCI)cc1CBr

nearest known ligand 0.46

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
MAPT P10636 7/20 0.46
ALDH1A1 P00352 5/20 0.44
LMNA P02545 2/20 0.44
KMT2A Q03164 4/20 0.39
MEN1 O00255 3/20 0.39
MAPK1 P28482 2/20 0.39
RECQL P46063 1/20 0.39
SMN1; SMN2 Q16637 3/20 0.37
KDM4E B2RXH2 4/20 0.37
HTT P42858 1/20 0.36
NPC1 O15118 2/20 0.36
RAB9A P51151 2/20 0.36
TLR4 O00206 1/20 0.35
TLR2 O60603 1/20 0.35
HPGD P15428 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL21954537 0.87 MAPT (0.48) MAPTALDH1A1LMNAKMT2AMEN1
SCHEMBL67179 0.86 MAPT (0.46) MAPTALDH1A1LMNAKMT2AMEN1
SCHEMBL66583 0.86 MAPT (0.46) MAPTALDH1A1LMNAKMT2AMEN1
SCHEMBL3127086 0.81 MAPT (0.42) MAPTALDH1A1LMNAKMT2AMEN1
SCHEMBL3127146 0.79 MAPT (0.48) MAPTALDH1A1LMNAKMT2AMEN1
SCHEMBL3123744 0.79 MAPT (0.40) MAPTALDH1A1LMNAKMT2AMEN1
SCHEMBL8790516 0.78 MAPT (0.54) MAPTALDH1A1LMNAKMT2AMEN1
SCHEMBL5050095 0.77 ALDH1A1 (0.48) MAPTALDH1A1LMNAKMT2AMEN1
SCHEMBL30293228 0.77 ALDH1A1 (0.48) MAPTALDH1A1LMNAKMT2AMEN1
SCHEMBL21642649 0.76 MAPT (0.46) MAPTALDH1A1LMNAKMT2AMEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1865379-B1 Method for resist pattern formation, and process for device prodution CANON KK (JP) 2013-01-16 EP disclosed
US-8129087-B2 Block copolymer and substrate processing method CANON KABUSHIKI KAISHA (JP) 2012-03-06 US disclosed
US-7651834-B2 Photosensitive compound, photosensitive composition, method for resist pattern formation, and process for device production CANON KABUSHIKI KAISHA (JP) 2010-01-26 US disclosed
US-20090311637-A1 BLOCK COPOLYMER AND SUBSTRATE PROCESSING METHOD CANON KABUSHIKI KAISHA (JP) 2009-12-17 US disclosed
US-20070287105-A1 PHOTOSENSITIVE COMPOUND, PHOTOSENSITIVE COMPOSITION, METHOD FOR RESIST PATTERN FORMATION, AND PROCESS FOR DEVICE PRODUCTION CANON KABUSHIKI KAISHA (JP) 2007-12-13 US disclosed
EP-1865379-A1 Photosensitive compound, photosensitive composition, method for resist pattern formation, and process for device prodution Canon Kabushiki Kaisha (JP) 2007-12-12 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20070287105-A1 PHOTOSENSITIVE COMPOUND, PHOTOSENSITIVE COMPOSITION, METHOD FOR RESIST PATTERN FORMATION, AND PROCESS FOR DEVICE PRODUCTION RER1, C1R, CRY2 MAPT 2153/4885ALDH1A1 2569/4885LMNA 2543/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.