4-Vinylphenol

4-Vinylphenol

SCHEMBL3132839

C=Cc1ccc(C(=O)O)cc1.C=Cc1ccc(O)cc1.C=Cc1ccc(OC)cc1

nearest known ligand 0.62

Full drug profile on Sugi Atlas →

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CA2 P00918 3/20 0.62
CA1 P00915 2/20 0.62
MAPT P10636 2/20 0.57
XDH P47989 2/20 0.57
RAB9A P51151 2/20 0.57
F3 P13726 2/20 0.57
P4HB P07237 1/20 0.57
CALM1 P0DP23 1/20 0.57
MEN1 O00255 1/20 0.57
ALDH1A1 P00352 1/20 0.57
KMT2A Q03164 1/20 0.57
NPC1 O15118 1/20 0.53
POLB P06746 1/20 0.53
SMN1; SMN2 Q16637 1/20 0.53
APP P05067 1/20 0.52
TAS2R14 Q9NYV8 1/20 0.50
CA12 O43570 1/20 0.50
CA3 P07451 1/20 0.50
TYR P14679 1/20 0.50
DRD1 P21728 1/20 0.50

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
4-Vinylphenol SCHEMBL3140670 0.87 LTA4H (0.59) MAPTXDHRAB9AF3P4HB
Paraben SCHEMBL20695772 0.87 CA2 (0.67) CA2CA1MAPTF3ALDH1A1
4-Vinylphenol SCHEMBL3134404 0.87 CA2 (0.67) CA2CA1MAPTF3ALDH1A1
SCHEMBL4904356 0.82 MAPT (0.59) CA2CA1MAPTXDHRAB9A
P-Methoxy-Acetophenone SCHEMBL9717478 0.80 MAPT (0.53) CA2CA1MAPTXDHRAB9A
4-Vinylphenol SCHEMBL3118949 0.80 CA2 (0.56) CA2CA1MAPTRAB9AF3
SCHEMBL5692868 0.80 XDH (0.78) CA2CA1MAPTXDHRAB9A
P-Anisic Acid SCHEMBL11200480 0.80 CA1 (0.77) CA2CA1XDHRAB9AALDH1A1
SCHEMBL5692873 0.80 XDH (0.78) CA2CA1MAPTXDHRAB9A
P-Anisic Acid SCHEMBL27479191 0.79 CA1 (0.91) CA2CA1MAPTXDHRAB9A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2146246-B1 Negative resist composition and patterning process SHINETSU CHEMICAL CO (JP) 2013-08-28 EP disclosed
EP-2146246-A1 Negative resist composition and patterning process Shin-Etsu Chemical Co., Ltd. (JP) 2010-01-20 EP disclosed
EP-1791025-A2 Negative resist composition and patterning process Shin-Etsu Chemical Co., Ltd. (JP) 2007-05-30 EP disclosed
US-20070111139-A1 NEGATIVE RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2007-05-17 US disclosed