SCHEMBL3132983

SCHEMBL3132983

Cc1ccc(S(OS(=O)(=O)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F)(c2ccccc2)c2ccc(C)cc2)cc1

nearest known ligand 0.42

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CA1 P00915 12/20 0.42
CA2 P00918 12/20 0.42
HSD11B1 P28845 1/20 0.38
HTT P42858 1/20 0.38
SMN1; SMN2 Q16637 1/20 0.38
GAA P10253 2/20 0.36
BCHE P06276 1/20 0.36
ACHE P22303 1/20 0.36
CA12 O43570 2/20 0.36
CA9 Q16790 2/20 0.36
NR1H2 P55055 1/20 0.35
KDM4E B2RXH2 1/20 0.34
ALDH1A1 P00352 1/20 0.34
CYP1A2 P05177 1/20 0.34
CYP3A4 P08684 1/20 0.34
CYP2D6 P10635 1/20 0.34
CYP2C9 P11712 1/20 0.34
HPGD P15428 1/20 0.34
ALOX12 P18054 1/20 0.34
CYP2C19 P33261 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3132826 1.00 CA1 (0.42) CA1CA2HSD11B1HTTSMN1; SMN2
SCHEMBL546899 1.00 CA1 (0.42) CA1CA2HSD11B1HTTSMN1; SMN2
SCHEMBL3130060 1.00 CA1 (0.42) CA1CA2HSD11B1HTTSMN1; SMN2
SCHEMBL219926 0.99 CA1 (0.41) CA1CA2HSD11B1HTTSMN1; SMN2
SCHEMBL3129919 0.99 CA1 (0.41) CA1CA2HSD11B1HTTSMN1; SMN2
SCHEMBL1593709 0.94 HSD11B1 (0.40) CA1CA2HSD11B1HTTSMN1; SMN2
SCHEMBL562808 0.94 CA1 (0.46) CA1CA2GAABCHEACHE
SCHEMBL271339 0.93 CA1 (0.44) CA1CA2GAABCHEACHE
SCHEMBL60138 0.91 CA2 (0.44) CA1CA2HSD11B1NR1H2
SCHEMBL4535203 0.91 CA2 (0.44) CA1CA2HSD11B1NR1H2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1676835-B1 PROCESS FOR PRODUCING TRIARYLSULFONIUM SALT WAKO PURE CHEM IND LTD (JP) 2014-12-10 EP disclosed
US-7642368-B2 for use as acid generator in semiconductor manufacture; triarylsulfonium salt having a structure that only one aromatic ring of three is different, in a high yield and by-product inhibition; reacting a diaryl sulfoxide with an aryl Grignard reagent in presence of chlorotrialkylsilane and strong acid WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) 2010-01-05 US disclosed
EP-1676835-A1 PROCESS FOR PRODUCING TRIARYLSULFONIUM SALT Wako Pure Chemical Industries, Ltd. (JP) 2006-07-05 EP disclosed