Predicted protein targets (top 6)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA2 | P00918 | 16/20 | 0.44 |
| ▸ | CA1 | P00915 | 15/20 | 0.44 |
| ▸ | HSD11B1 | P28845 | 1/20 | 0.37 |
| ▸ | NR1H2 | P55055 | 2/20 | 0.37 |
| ▸ | NR1I2 | O75469 | 1/20 | 0.36 |
| ▸ | NR1H3 | Q13133 | 1/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL60438 | 1.00 | CA2 (0.44) | CA2CA1HSD11B1NR1H2NR1I2 | |
| SCHEMBL965542 | 1.00 | CA2 (0.44) | CA2CA1HSD11B1NR1H2NR1I2 | |
| SCHEMBL60138 | 1.00 | CA2 (0.44) | CA2CA1HSD11B1NR1H2NR1I2 | |
| SCHEMBL51400 | 0.98 | CA1 (0.43) | CA2CA1HSD11B1NR1H2NR1I2 | |
| SCHEMBL965951 | 0.93 | CA1 (0.39) | CA2CA1HSD11B1NR1H2NR1I2 | |
| SCHEMBL217002 | 0.93 | HTR6 (0.38) | CA2CA1HSD11B1NR1H2NR1H3 | |
| SCHEMBL3139139 | 0.93 | CA1 (0.43) | CA2CA1HSD11B1NR1H2NR1I2 | |
| SCHEMBL3139675 | 0.93 | CA1 (0.43) | CA2CA1HSD11B1NR1H2NR1I2 | |
| SCHEMBL3136124 | 0.93 | CA1 (0.43) | CA2CA1HSD11B1NR1H2NR1I2 | |
| SCHEMBL3130361 | 0.93 | CA1 (0.43) | CA2CA1HSD11B1NR1H2NR1I2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7504193-B2 | Positive resist composition and pattern forming method using the same | FUJIFILM CORPORATION (JP) | 2009-03-17 | — | — | US | disclosed |
| US-7435527-B2 | Mixture of acid generator and resin insoluble in alkaline developer and another acid decomposable compound | FUJIFILM CORPORATION (JP) | 2008-10-14 | — | — | US | disclosed |
| US-7157208-B2 | Positive resist composition and pattern forming method using the same | FUJI PHOTO FILM CO., LTD. (JP) | 2007-01-02 | — | — | US | disclosed |
| EP-1637927-A1 | Positive resist composition and pattern forming method using the same | FUJI PHOTO FILM CO., LTD. (JP) | 2006-03-22 | — | — | EP | disclosed |
| US-20060046195-A1 | Positive resist composition and pattern forming method using the same | FUJI PHOTO FILM CO., LTD. | 2006-03-02 | — | — | US | disclosed |
| US-20050277060-A1 | Positive resist composition and pattern forming method using the same | FUJI PHOTO FILM CO., LTD. | 2005-12-15 | — | — | US | disclosed |
| US-20050186506-A1 | Positive resist composition and pattern forming method using the same | FUJI PHOTO FILM CO., LTD. | 2005-08-25 | — | — | US | disclosed |
| EP-1566694-A1 | Positive resist composition and pattern forming method using the same | Fuji Photo Film Co., Ltd. (JP) | 2005-08-24 | — | — | EP | disclosed |
| US-20040253538-A1 | Positive resist composition | FUJI PHOTO FILM CO., LTD. | 2004-12-16 | — | — | US | disclosed |