SCHEMBL3132992

SCHEMBL3132992

Cc1ccc(-c2cccc(S)c2-c2ccc(C)cc2)cc1.O=S(=O)(O)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F

nearest known ligand 0.38

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ENPP1 P22413 1/20 0.38
PTGS2 P35354 3/20 0.34
PTGS1 P23219 1/20 0.33
AKR1C3 P42330 1/20 0.32
AKR1C2 P52895 1/20 0.32
POLB P06746 2/20 0.32
MEN1 O00255 1/20 0.32
KMT2A Q03164 1/20 0.32
IDH2 P48735 1/20 0.32
FFAR1 O14842 1/20 0.31
CDK1 P06493 1/20 0.31
CCNB1 P14635 1/20 0.31
CCNA2 P20248 1/20 0.31
CDK2 P24941 1/20 0.31
CDK7 P50613 1/20 0.31
CCNH P51946 1/20 0.31
CCNA1 P78396 1/20 0.31
FFAR4 Q5NUL3 1/20 0.31
SDHB P21912 1/20 0.31
CA1 P00915 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1089839 1.00 ENPP1 (0.38) ENPP1PTGS2PTGS1AKR1C3AKR1C2
SCHEMBL3129927 0.99 ENPP1 (0.38) ENPP1PTGS2PTGS1AKR1C3AKR1C2
SCHEMBL3136273 0.89 MAPT (0.34) MEN1KMT2A
SCHEMBL3139678 0.89 ENPP1 (0.36) ENPP1PTGS2PTGS1CA1CA2
SCHEMBL3130364 0.89 ENPP1 (0.36) ENPP1PTGS2PTGS1CA1CA2
SCHEMBL3136046 0.89 USP7 (0.35) CA1CA2
SCHEMBL3126297 0.89 MAPT (0.34) MEN1KMT2A
SCHEMBL3135792 0.88 HSD11B1 (0.34) AKR1C3AKR1C2
SCHEMBL3137414 0.88 HSD11B1 (0.34) AKR1C3AKR1C2
SCHEMBL1089301 0.88 PTGS2 (0.33) PTGS2PTGS1CA1CA2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1676835-B1 PROCESS FOR PRODUCING TRIARYLSULFONIUM SALT WAKO PURE CHEM IND LTD (JP) 2014-12-10 EP disclosed
US-7642368-B2 for use as acid generator in semiconductor manufacture; triarylsulfonium salt having a structure that only one aromatic ring of three is different, in a high yield and by-product inhibition; reacting a diaryl sulfoxide with an aryl Grignard reagent in presence of chlorotrialkylsilane and strong acid WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) 2010-01-05 US disclosed
EP-1676835-A1 PROCESS FOR PRODUCING TRIARYLSULFONIUM SALT Wako Pure Chemical Industries, Ltd. (JP) 2006-07-05 EP disclosed