SCHEMBL1089301

SCHEMBL1089301

O=S(=O)(O)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F.Sc1cccc(-c2ccc(Cl)cc2)c1-c1ccc(Cl)cc1

nearest known ligand 0.33

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
PTGS2 P35354 2/20 0.33
PTGS1 P23219 1/20 0.33
TP53 P04637 1/20 0.33
MAPT P10636 1/20 0.33
ADORA2A P29274 1/20 0.32
ADORA1 P30542 1/20 0.32
BCL2 P10415 1/20 0.31
BCL2L1 Q07817 1/20 0.31
KLRK1 P26718 1/20 0.31
MICA Q29983 1/20 0.31
RAET1L Q5VY80 1/20 0.31
FGFR1 P11362 1/20 0.30
SRC P12931 1/20 0.30
FGFR2 P21802 1/20 0.30
FGFR4 P22455 1/20 0.30
FGFR3 P22607 1/20 0.30
ARF6 P62330 1/20 0.30
CA1 P00915 1/20 0.30
CA2 P00918 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3141297 1.00 PTGS2 (0.33) PTGS2PTGS1TP53MAPTADORA2A
SCHEMBL3139727 0.99 PTGS2 (0.34) PTGS2PTGS1TP53MAPTADORA2A
SCHEMBL3136046 0.89 USP7 (0.35) CA1CA2
SCHEMBL3136273 0.89 MAPT (0.34) TP53MAPT
SCHEMBL3130364 0.89 ENPP1 (0.36) PTGS2PTGS1CA1CA2
SCHEMBL3126297 0.89 MAPT (0.34) TP53MAPT
SCHEMBL3139678 0.89 ENPP1 (0.36) PTGS2PTGS1CA1CA2
SCHEMBL1089839 0.88 ENPP1 (0.38) PTGS2PTGS1CA1CA2
SCHEMBL3132992 0.88 ENPP1 (0.38) PTGS2PTGS1CA1CA2
SCHEMBL3144267 0.88 MAPT (0.35) TP53MAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 37 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2326744-B1 METAL COMPOSITIONS AND METHODS OF MAKING SAME PRYOG LLC (US) 2022-06-01 EP claimed
EP-2326744-B1 METAL COMPOSITIONS AND METHODS OF MAKING SAME PRYOG LLC (US) 2022-06-01 EP disclosed
EP-2387735-B1 NONPOLYMERIC BINDERS FOR SEMICONDUCTOR SUBSTRATE COATINGS FUJIFILM ELECTRONIC MAT USA INC (US) 2019-03-13 EP disclosed
EP-1676835-B1 PROCESS FOR PRODUCING TRIARYLSULFONIUM SALT WAKO PURE CHEM IND LTD (JP) 2014-12-10 EP disclosed
US-8802346-B2 Metal compositions and methods of making same PRYOG, LLC (US) 2014-08-12 US disclosed
US-8709705-B2 Metal-containing compositions and method of making same PRYOG, LLC (US) 2014-04-29 US disclosed
US-8535872-B2 Thermally cured underlayer for lithographic application FUJIFILM ELECTRONIC MATERIALS, U.S.A., INC. (US) 2013-09-17 US disclosed
US-20120315451-A1 Metal-Containing Compositions and Method of Making Same PRYOG LLC 2012-12-13 US disclosed
US-20120178871-A1 THERMALLY CURED UNDERLAYER FOR LITHOGRAPHIC APPLICATION DE BINOD B (US) 2012-07-12 US disclosed
US-8153346-B2 Hydroxyl containing polymer, amino crosslinking agent and thermal acid generator; undercoating for multilayer lithography material FUJIFILM ELECTRONIC MATERIALS, U.S.A., INC. (US) 2012-04-10 US disclosed
WO-2008070060-A2 DEVICE MANUFACTURING PROCESS UTILIZING A DOUBLE PATTERING PROCESS FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) 2008-06-12 WO disclosed
US-20070083060-A1 for use as acid generator in semiconductor manufacture; triarylsulfonium salt having a structure that only one aromatic ring of three is different, in a high yield and by-product inhibition; reacting a diaryl sulfoxide with an aryl Grignard reagent in presence of chlorotrialkylsilane and strong acid FUJIFILM WAKO PURE CHEMICAL CORPORATION (JP) 2007-04-12 US disclosed
EP-1743363-A2 THERMALLY CURED UNDERCOAT FOR LITHOGRAPHIC APPLICATION FujiFilm Electronic Materials USA, Inc. (US) 2007-01-17 EP disclosed
EP-1676835-A1 PROCESS FOR PRODUCING TRIARYLSULFONIUM SALT Wako Pure Chemical Industries, Ltd. (JP) 2006-07-05 EP disclosed
EP-1656590-A2 NOVEL PHOTOSENSITIVE BILAYER COMPOSITION FujiFilm Electronic Materials USA, Inc. (US) 2006-05-17 EP disclosed
US-20050238997-A1 Thermally cured undercoat for lithographic application FUJIFILM ELECTRONIC MATERIALS, U.S.A., INC. 2005-10-27 US disclosed
WO-2005089150-A2 THERMALLY CURED UNDERCOAT FOR LITHOGRAPHIC APPLICATION FUJIFILM ELECTRONIC MATERIALS USA INC. (US) 2005-09-29 WO disclosed
US-6929897-B2 Photosensitive bilayer composition ARCH SPECIALTY CHEMICALS, INC. (US) 2005-08-16 US disclosed
WO-2005022257-A2 NOVEL PHOTOSENSITIVE BILAYER COMPOSITION ARCH SPECIALTY CHEMICALS, INC. (US) 2005-03-10 WO disclosed
US-20050042542-A1 Novel photosensitive bilayer composition ARCH SPECIALTY CHEMICALS, INC. 2005-02-24 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20070083060-A1 for use as acid generator in semiconductor manufacture; triarylsulfonium salt having a structure that only one aromatic ring of three is different, in a high yield and by-product inhibition; reacting a diaryl sulfoxide with an aryl Grignard reagent in presence of chlorotrialkylsilane and strong acid ARSA, HAO2, HAO1 PTGS2 1519/4885PTGS1 561/4885TP53 4084/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.