SCHEMBL3136273

SCHEMBL3136273

FC(F)(F)c1ccc(-c2cccc(S)c2-c2ccc(C(F)(F)F)cc2)cc1.O=S(=O)(O)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F

nearest known ligand 0.34

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
MAPT P10636 2/20 0.34
MEN1 O00255 1/20 0.34
LMNA P02545 1/20 0.34
HTT P42858 1/20 0.34
KMT2A Q03164 1/20 0.34
MAOB P27338 1/20 0.34
PGAM1 P18669 1/20 0.34
MMP2 P08253 1/20 0.34
MMP9 P14780 1/20 0.34
PTPN1 P18031 2/20 0.33
TOP2A P11388 1/20 0.33
TOP2B Q02880 1/20 0.33
ERAP1 Q9NZ08 1/20 0.33
KIF11 P52732 4/20 0.33
CYP2C8 P10632 1/20 0.33
HSD11B1 P28845 2/20 0.32
KDR P35968 1/20 0.32
TP53 P04637 1/20 0.32
BACE1 P56817 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3126297 1.00 MAPT (0.34) MAPTMEN1LMNAHTTKMT2A
SCHEMBL3144267 0.99 MAPT (0.35) MAPTMEN1LMNAHTTKMT2A
SCHEMBL3135792 0.92 HSD11B1 (0.34) PGAM1MMP2MMP9PTPN1HSD11B1
SCHEMBL3137414 0.92 HSD11B1 (0.34) PGAM1MMP2MMP9PTPN1HSD11B1
SCHEMBL3139784 0.91 HSD11B1 (0.34) PGAM1MMP2MMP9PTPN1HSD11B1
SCHEMBL3136046 0.90 USP7 (0.35) MMP2PTPN1KIF11BACE1
SCHEMBL3130364 0.90 ENPP1 (0.36) PTPN1HSD11B1
SCHEMBL3139678 0.90 ENPP1 (0.36) PTPN1HSD11B1
SCHEMBL3141297 0.89 PTGS2 (0.33) MAPTTP53
SCHEMBL1089301 0.89 PTGS2 (0.33) MAPTTP53

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1676835-B1 PROCESS FOR PRODUCING TRIARYLSULFONIUM SALT WAKO PURE CHEM IND LTD (JP) 2014-12-10 EP disclosed
US-7642368-B2 for use as acid generator in semiconductor manufacture; triarylsulfonium salt having a structure that only one aromatic ring of three is different, in a high yield and by-product inhibition; reacting a diaryl sulfoxide with an aryl Grignard reagent in presence of chlorotrialkylsilane and strong acid WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) 2010-01-05 US disclosed
EP-1676835-A1 PROCESS FOR PRODUCING TRIARYLSULFONIUM SALT Wako Pure Chemical Industries, Ltd. (JP) 2006-07-05 EP disclosed