SCHEMBL3136307

SCHEMBL3136307

Cc1ccc(S(=O)(=O)OS(c2ccccc2)(c2ccc(Cl)cc2)c2ccc(Cl)cc2)cc1

nearest known ligand 0.51

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TDP1 Q9NUW8 2/20 0.51
BCHE P06276 2/20 0.45
ACHE P22303 2/20 0.45
MAPT P10636 2/20 0.43
KDM4E B2RXH2 2/20 0.43
ALDH1A1 P00352 2/20 0.43
VDR P11473 1/20 0.43
SMN1; SMN2 Q16637 2/20 0.42
HTT P42858 1/20 0.42
ENPP3 O14638 1/20 0.42
ENPP1 P22413 1/20 0.42
ENPP2 Q13822 1/20 0.42
KMT2A Q03164 4/20 0.41
GAA P10253 2/20 0.41
MEN1 O00255 2/20 0.41
LMNA P02545 2/20 0.41
TP53 P04637 1/20 0.41
CYP1A2 P05177 1/20 0.41
CYP3A4 P08684 1/20 0.41
CYP2D6 P10635 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3135353 1.00 TDP1 (0.51) TDP1BCHEACHEMAPTKDM4E
SCHEMBL3144536 0.92 VDR (0.49) TDP1BCHEACHEKDM4EALDH1A1
SCHEMBL64190 0.92 VDR (0.49) TDP1BCHEACHEKDM4EALDH1A1
SCHEMBL2962485 0.92 VDR (0.49) TDP1BCHEACHEKDM4EALDH1A1
SCHEMBL2964106 0.92 VDR (0.49) TDP1BCHEACHEKDM4EALDH1A1
SCHEMBL2955938 0.92 VDR (0.49) TDP1BCHEACHEKDM4EALDH1A1
SCHEMBL5165470 0.92 TDP1 (0.59) TDP1KDM4EALDH1A1ENPP3ENPP1
SCHEMBL4135080 0.84 CNR2 (0.50) TDP1BCHEACHEMAPTKDM4E
SCHEMBL5314186 0.84 BCHE (0.54) TDP1BCHEACHEMAPTKDM4E
SCHEMBL2966008 0.84 GAA (0.52) TDP1MAPTKDM4EALDH1A1VDR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1676835-B1 PROCESS FOR PRODUCING TRIARYLSULFONIUM SALT WAKO PURE CHEM IND LTD (JP) 2014-12-10 EP disclosed
US-7642368-B2 for use as acid generator in semiconductor manufacture; triarylsulfonium salt having a structure that only one aromatic ring of three is different, in a high yield and by-product inhibition; reacting a diaryl sulfoxide with an aryl Grignard reagent in presence of chlorotrialkylsilane and strong acid WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) 2010-01-05 US disclosed
EP-1676835-A1 PROCESS FOR PRODUCING TRIARYLSULFONIUM SALT Wako Pure Chemical Industries, Ltd. (JP) 2006-07-05 EP disclosed