SCHEMBL3136665

SCHEMBL3136665

Cc1ccc(S(=O)(=O)[O-])cc1.Cc1cccc([S+](c2ccccc2)c2ccccc2)c1

nearest known ligand 0.42

Known targets — ChEMBL curated mechanism

CHRM1CHRM2CHRM3CHRM4CHRM5SLC6A2dacAdacBdacCftsImrcAmrcBmrdA

The experimentally established mechanism targets of None. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TDP1 Q9NUW8 3/20 0.42
HTT P42858 2/20 0.42
L3MBTL1 Q9Y468 2/20 0.42
BCHE P06276 1/20 0.41
ACHE P22303 1/20 0.41
CA12 O43570 3/20 0.40
CA9 Q16790 3/20 0.40
C5AR1 P21730 1/20 0.40
CA1 P00915 1/20 0.40
CA2 P00918 1/20 0.40
SMN1; SMN2 Q16637 1/20 0.39
CYP3A4 P08684 3/20 0.39
CYP2D6 P10635 2/20 0.39
LMNA P02545 2/20 0.39
MAPK1 P28482 1/20 0.39
THPO P40225 1/20 0.39
KDM4E B2RXH2 2/20 0.39
NPSR1 Q6W5P4 1/20 0.39
RXFP1 Q9HBX9 1/20 0.39
GAA P10253 3/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL64189 0.90 CA12 (0.47) TDP1HTTL3MBTL1BCHEACHE
SCHEMBL7133269 0.90 CA12 (0.47) TDP1HTTL3MBTL1BCHEACHE
P-Xylene SCHEMBL3404430 0.88 GAA (0.46) TDP1HTTL3MBTL1BCHEACHE
SCHEMBL3144525 0.88 CA12 (0.46) TDP1HTTL3MBTL1BCHEACHE
SCHEMBL2964104 0.88 CA12 (0.46) TDP1HTTL3MBTL1BCHEACHE
SCHEMBL2962482 0.86 GAA (0.45) TDP1HTTL3MBTL1BCHEACHE
SCHEMBL3141431 0.86 FFAR1 (0.42) HTTL3MBTL1BCHEACHECA1
SCHEMBL2955936 0.84 GAA (0.46) TDP1HTTL3MBTL1BCHEACHE
SCHEMBL3141168 0.84 HTT (0.44) TDP1HTTL3MBTL1BCHEACHE
Trifluoromethanesulfonic Acid SCHEMBL1615717 0.83 GPR3 (0.47) L3MBTL1ACHECYP3A4CYP1A2CYP2C9

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11072720-B2 Aqueous ink, ink cartridge and ink jet recording method CANON KABUSHIKI KAISHA (JP) 2021-07-27 US disclosed
US-20200071554-A1 AQUEOUS INK, INK CARTRIDGE AND INK JET RECORDING METHOD CANON KABUSHIKI KAISHA (JP) 2020-03-05 US disclosed
EP-1676835-B1 PROCESS FOR PRODUCING TRIARYLSULFONIUM SALT WAKO PURE CHEM IND LTD (JP) 2014-12-10 EP disclosed
US-7642368-B2 for use as acid generator in semiconductor manufacture; triarylsulfonium salt having a structure that only one aromatic ring of three is different, in a high yield and by-product inhibition; reacting a diaryl sulfoxide with an aryl Grignard reagent in presence of chlorotrialkylsilane and strong acid WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) 2010-01-05 US disclosed
EP-1676835-A1 PROCESS FOR PRODUCING TRIARYLSULFONIUM SALT Wako Pure Chemical Industries, Ltd. (JP) 2006-07-05 EP disclosed
US-6723483-B1 Sulfonium salt compounds WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) 2004-04-20 US disclosed
EP-1113005-B1 Sulfonium salt compounds WAKO PURE CHEM IND LTD (JP) 2003-08-06 EP disclosed
EP-1238969-A2 Sulfonium salt compounds Wako Pure Chemical Industries, Ltd. (JP) 2002-09-11 EP disclosed
EP-1113005-A1 Sulfonium salt compounds Wako Pure Chemical Industries, Ltd. (JP) 2001-07-04 EP disclosed