P-Xylene

P-Xylene

SCHEMBL3404430

Cc1ccc(C)cc1.O=S(=O)([O-])c1ccccc1.c1ccc([S+](c2ccccc2)c2ccccc2)cc1

nearest known ligand 0.46

Full drug profile on Sugi Atlas →

Known targets — ChEMBL curated mechanism

CHRNA1CHRNB1CHRNDCHRNECHRNG

The experimentally established mechanism targets of P-Xylene. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
GAA P10253 4/20 0.46
CA12 O43570 4/20 0.46
CA9 Q16790 4/20 0.46
CA1 P00915 3/20 0.46
CA2 P00918 3/20 0.46
HTT P42858 1/20 0.44
SMN1; SMN2 Q16637 1/20 0.44
CYP3A4 P08684 3/20 0.43
CYP2D6 P10635 2/20 0.43
CYP1A2 P05177 2/20 0.43
KDM4E B2RXH2 1/20 0.43
ALDH1A1 P00352 1/20 0.43
CYP2C9 P11712 1/20 0.43
HPGD P15428 1/20 0.43
ALOX12 P18054 1/20 0.43
CYP2C19 P33261 1/20 0.43
GFER P55789 1/20 0.43
TDP1 Q9NUW8 1/20 0.43
LMNA P02545 1/20 0.43
MAPK1 P28482 1/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2962482 0.98 GAA (0.45) GAACA12CA9CA1CA2
SCHEMBL7133269 0.98 CA12 (0.47) GAACA12CA9CA1CA2
SCHEMBL64189 0.98 CA12 (0.47) GAACA12CA9CA1CA2
SCHEMBL2955936 0.96 GAA (0.46) GAACA12CA9CA1CA2
SCHEMBL3144525 0.96 CA12 (0.46) GAACA12CA9CA1CA2
SCHEMBL2964104 0.96 CA12 (0.46) GAACA12CA9CA1CA2
SCHEMBL137132 0.90 HTR6 (0.46) CA12CA9CA1CA2SMN1; SMN2
SCHEMBL3136301 0.88 LMNA (0.43) GAACA12CA9CA1CA2
SCHEMBL547499 0.88 ACHE (0.42) GAACA12CA9CA1CA2
SCHEMBL3135344 0.88 LMNA (0.43) GAACA12CA9CA1CA2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8557509-B2 Negative resist composition, patterning process, and testing process and preparation process of negative resist composition SHIN-ETSU CHEMICAL CO., LTD. (JP) 2013-10-15 US disclosed
EP-2253996-A1 Negative resist composition, patterning process, and testing process and preparation process of negative resist composition Shin-Etsu Chemical Co., Ltd. (JP) 2010-11-24 EP disclosed
US-20100291484-A1 Negative resist composition, patterning process, and testing process and preparation process of negative resist composition SHIN-ETSU CHEMICAL CO., LTD. (JP) 2010-11-18 US disclosed